喷雾干燥法制备CeO_2-SiO_2复合抛光粉  

Preparation of CeO_2-SiO_2 Composite Polishing Powders by Spray Drying

作　　者：韩磊[1,2] 李梅[1,2] 柳召刚[1,2] 王觅堂[1,2] 胡艳宏[1,2] 陶豹[1,2] 

机构地区：[1]内蒙古科技大学材料与冶金学院,内蒙古包头014010 [2]内蒙古科技大学内蒙古自治区稀土现代冶金新技术与应用重点实验室,内蒙古包头014010

出　　处：《中国粉体技术》2015年第3期16-20,共5页China Powder Science and Technology

基　　金：国家杰出青年科学基金项目;编号:51025416;教育部创新团队项目;编号:IRT1065;内蒙古自治区自然科学基金项目;编号:2012MS0206;内蒙古自治区高等学校"创新团队发展计划"项目;编号:NMGIRT1104

摘　　要：以碳酸铈为铈源,以硅溶胶为硅源,通过喷雾干燥法制备Ce O2-Si O2复合氧化物前驱体,再通过煅烧得到复合抛光粉;利用X射线衍射、扫描电子显微镜、激光粒度仪、zeta电位仪对复合抛光粉的晶体结构、表面形貌、粒径分布、zeta电位进行表征,并进行抛光性能研究。结果表明:当Ce O2与Si O2的质量比大于2∶1时,复合抛光粉中的Si O2能完全掺杂到Ce O2中,并且抛光效果优于Ce O2和Si O2抛光粉的;当Ce O2与Si O2的质量比为4∶1时,复合抛光粉的粒径d50为0.985μm,抛蚀量为0.296 0 g,表面划痕少,抛光效果最好。The precursor of CeO2-SiO2 composite polishing powders was obtained by the method of spray drying with cerium carbonate as cerium resource and silicon soliquid as silicon resource. The composite polishing powders were obtained by calcining. XRD, SEM, laser particle sizer, zeta potential analyzer were used to characterize the crystal structure, surface morphology, particle size and zeta potential. The polishing effect of composite polishing powdes was studied. The results show that SiO2 within composite polishing powders can completely dope in CeO2 when the mass ratio of cerium oxide to silicon oxide is larger than 2：1, and the polishing effect of composite polishing powders is better than that of CeO2 and SiO2.When the mass ratio of cerium oxide to silicon oxide is 4：1, the particle size of the powders is 0.985 μm, the burnishing mass is 0.296 0 g, the superficial scratches are few, and the polishing effect of composite polishing powder achieves the best.

关 键 词：喷雾干燥 掺杂 复合抛光粉 抛光 

分 类 号：TQ133.3[化学工程—无机化工]