UNCD薄膜的研究进展与应用  

Development and Application of Ultrananocrystalline Diamond(UNCD) Thin Films

作　　者：俞力[1,2] 吕继磊[1] 游志恒[1] 朱金凤[1] 李赫[1] 江南[1] 诸跃进[2] 

机构地区：[1]中国科学院海洋新材料与应用技术重点实验室浙江省海洋材料与防护技术重点实验室中国科学院宁波材料技术与工程研究所,浙江宁波315201 [2]宁波大学理学院,浙江宁波315211

出　　处：《硬质合金》2015年第2期126-135,共10页Cemented Carbides

摘　　要：UNCD薄膜系其晶粒尺寸小于5 nm为主要特征高性能金钢石薄膜,有的研究者称为超纳米膜,具有诸多优异的物理和化学性能,在工业应用中得到广泛的青睐。UNCD不仅具备普通金刚石的各项性能,而且因其极小的晶粒尺寸,使得UNCD薄膜表面极其光滑,大大降低了摩擦系数,不需要进行抛光处理就可以直接进行工业应用,从而大大节省时间和成本。本文综述了近年来通过提高形核密度、气体掺杂、调节衬底温度等方法制备出高质量的UNCD膜,指出随着Ar掺入量的增加,二次形核率提高,晶粒尺寸细化。讨论了UNCD膜在MEMS器件、耐磨材料、表面声波和体声波器件以及生物医学应用领域的优势,并介绍了美国阿贡实验室和ADT公司在UNCD膜领域的研究进展。Uhrananocrystalline diamond （UNCD） thin films are widely used in many industrial applications because of excellent physical and chemical properties due to the grain size of less than 5 nm. Besides the traditional properties of crystalline diamond films, the UNCD films also have extremely small grain size so exhibit a smooth and uniform surface. The low friction coefficient of UNCD can make it avoid polishing process, which leads to time and cost savings. The preparation methods of high quality UNCD thin films are summarized, such as increasing nucleation speed, doping gas, adjusting substrate temperature, etc. It is pointed out that with the increase of Ar doping amount, the second nucleation rate of diamond grains increases, which leads to the finer diamond grains increases. The advantages of UNCD thin films are discussed in the application of MEMS device, wear resistant materials, surface acoustic wave and bulk acoustic wave device, biomedicine, etc. Furthermore, the research developments in the Argonne National Laboratory and Advanced Diamond Technologies Company on UNCD thin films are also introduced.

关 键 词：UNCD薄膜 化学气相沉积 掺杂 等离子体 

分 类 号：TB383.2[一般工业技术—材料科学与工程]