TiO_2 nanofilm growth by Ti ion implantation and thermal annealing in O_2 atmosphere  

作　　者：周小东 周思华 孙现科 张云丽 

机构地区：[1]School of Physics and Electromechnical Engineering, Zhoukou Normal University

出　　处：《Nuclear Science and Techniques》2015年第3期106-112,共7页核技术（英文）

基　　金：Supported by National Natural Science Foundation of China(No.11405280);Foundation from Education Department of Henan Province(No.14B140021);the Startup Foundation for Doctors of Zhoukou Normal University(No.zksybscx201210)

摘　　要：TiO2 nanofilms on surface of fused silica were fabricated by Ti ion implantation and subsequent thermal annealing in oxygen ambience. The silica glasses were implanted by 20 k V Ti ions to 1.5 × 1017ions/cm2 on an implanter of metal vapor vacuum arc(MEVVA) ion source. Effects of annealing parameters on formation,growth and phase transformation of the TiO2 nanofilms were studied in detail. Optical absorption spectroscopy,Raman scattering spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy measurements were done to figure out formation mechanism of the TiO2 nanofilms.The formation of TiO2 nanofilms was due to out-diffusion of the implanted Ti ions to the substrate surface,where they were oxidized into TiO2 nanoparticles. Formation, phase, and thickness of the TiO2 nanofilms can be well tailored by controlling annealing parameters.TiO2 nanofilms on surface of fused silica were fabricated by Ti ion implantation and subsequent thermal annealing in oxygen ambience. The silica glasses were implanted by 20 k V Ti ions to 1.5 × 10^17ions/cm^2 on an implanter of metal vapor vacuum arc（MEVVA） ion source. Effects of annealing parameters on formation,growth and phase transformation of the TiO2 nanofilms were studied in detail. Optical absorption spectroscopy,Raman scattering spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy measurements were done to figure out formation mechanism of the TiO2 nanofilms.The formation of TiO2 nanofilms was due to out-diffusion of the implanted Ti ions to the substrate surface,where they were oxidized into TiO2 nanoparticles. Formation, phase, and thickness of the TiO2 nanofilms can be well tailored by controlling annealing parameters.

关 键 词：TiO2纳米薄膜 离子注入机 薄膜生长 氧气气氛 热退火 纳米TIO2薄膜 X射线光电子能谱 TIO2纳米粒子 

分 类 号：TB383.1[一般工业技术—材料科学与工程]