电镀电源控制算法的研究与仿真应用  

Research on electroplating power supply control algorithm and its simulation applications

作　　者：顾蓉[1] 王宝忠[1] 刘浪[1] 

机构地区：[1]江苏科技大学电子信息学院,江苏镇江212003

出　　处：《现代电子技术》2015年第15期145-148,157,共5页Modern Electronics Technique

摘　　要：在直流电镀工艺需要电源输出电流调节范围宽、输出电流值稳定的背景下,针对PID参数整定困难,积分分离的增量式PID阈值选定困难,智能算法结构复杂、不易实现这几个问题,首先改进了PID算法,然后将最小二乘法应用在PID参数整定中,最后将改进的PID算法应用在电镀电源的控制中,实现了对系统的精密控制。改进的PID算法结构简单,参数易于整定,阈值易于选取,仿真结果表明,改进的PID算法在电镀电源控制中取得了良好的效果。DC electroplating technique needs power supply output wide adjustment range current and stable current value. Under this background,the PID algorithm is improved because it is difficult to tune PID parameter,hard to choose integral se?parated incremental PID threshold,and intelligent algorithm has complex structure and is difficult to implement. Then the least square method is applied in PID parameter tuning. Then the improved PID algorithm is applied in electroplating power control, and the precise control to the system is achieved. The improved PID algorithm has the advantages of simple structure,easy to tuning,liable to select the threshold. The simulation results show that the improved PID algorithm has achieved good results in electroplating power supply control.

关 键 词：增量式PID PID参数整定 最小二乘法 电镀电源 

分 类 号：TN05-34[电子电信—物理电子学] TP301.6[自动化与计算机技术—计算机系统结构]