环形抛光技术在列阵透镜制造中的应用  

Application of Continuous Polishing Technology to Manufacturing of a Lens Array

作　　者：焦翔[1,2] 朱健强[1] 樊全堂[1] 李养帅[1,2] 

机构地区：[1]中国科学院上海光学精密机械研究所,高功率激光物理联合实验室,上海201800 [2]中国科学院大学,北京100049

出　　处：《中国激光》2015年第7期265-270,共6页Chinese Journal of Lasers

基　　金：中以高功率激光技术国际合作研究(2010DFB70490)

摘　　要：针对传统方法抛光高功率激光实验中使用的长焦距列阵透镜单元遇到的检测困难、一致性差等问题,提出了采用环形抛光的新方法。对环形抛光系统的理论分析表明,抛光盘面形可以稳定在球面状态。利用这种特性,环形抛光法可以抛光小曲率球面。阐述了抛光盘面形的调节方法。利用0.69 m环形抛光机对口径45 mm、曲率半径57207 mm的列阵透镜单元进行了抛光,结果表明面形精度和一致性均优于平面摆动式抛光法。最后对环形抛光机可抛光的球面曲率半径范围进行了探讨,发现盘面尺寸越小球面抛光能力越强,直径0.8 m的盘面可抛光的曲率半径可低至10 m。Aiming at the problems such as difficult to mearsure and bad consistency of the surfaces in polishing long- focus lens array elements by conventional method, the new way using continuous polishing machine is proposed. According to the theoretical research of the continuous polishing system, the surface of the polishing pad can keep spherical. The workpieces with small curvature spherical surfaces can be polished with the character.The adjusting methods of the polishing pad surface curvature are elaborated. According to the experiments of polishing lens array elements with aperture of 45 mm and curvature radius of 57207 mm in 0.69 m continuous polishing machine, the element surface accuracy and consistency are both better than using conventional oscillating polishing method. At last, the range of the curvature radius that can be polished in the continuous polishing machine is discussed and find that the smaller the polishing pad is, the stronger the ability of polishing spherical surface is.The radius of curvature which is polished in 0.8 m diameter can be as amall as 10 m.

关 键 词：光学制造 环形抛光 列阵透镜 面形控制 大曲率半径 

分 类 号：TG356.28[金属学及工艺—金属压力加工]