亚波长金属光栅光刻条纹分布  

The striped distribution of sub-wavelength metallic gratings lithography

作　　者：米佳佳[1] 张颖[1] 石建平[1] 

机构地区：[1]安徽师范大学物理与电子信息学院,安徽芜湖241000

出　　处：《淮南师范学院学报》2015年第3期32-34,共3页Journal of Huainan Normal University

摘　　要：亚波长金属光栅表面等离激元(SPP)具有光场局域增强、异常透射等现象,被广泛用于光刻。利用FDTD Solutions软件,改变金属光栅材料、周期、厚度等因素,通过有限时域差分方法探究表面等离共振光刻条纹分布特点。仿真结果表明,亚波长金属光栅光刻条纹分布周期是光栅的周期一半,光刻条纹强度在表面等离共振波长作用下也会大于入射光强度。该研究为微纳米光学器件的设计提供了依据。Sub-vavelength metallic gratings has been widely used in lithography based on extraordinary transmission efficiency and local field enhancement. In order to deeply understand SPPs striped distribution period, we adjusted the materials , period , thickness of metallic gratings ,used Finite-Difference Time- Domain method in Lumerical FDTD Solutions computer software. The numerical results show that lithography striped resolution was half of gratings periods,and intensity of photoresist was greater than the incident light under SPPs wavelength.It is believed that this study will provide useful information for furtherdesigning micro-ano optical elements.

关 键 词：亚波长金属光栅 表面等离子体激元 光刻 有限时域差分方法 

分 类 号：O436[机械工程—光学工程]