微晶玻璃超光滑抛光过程中抛光剂选型实验研究  

Experimental Study on the Selection of Polishing Powder During Super-Smooth Polishing Progress of Glass-Ceramic

作　　者：袁顺山[1] 程子清[1] 陈光[1] 

机构地区：[1]华中光电技术研究所-武汉光电国家实验室,湖北武汉430223

出　　处：《光学与光电技术》2015年第4期87-90,共4页Optics & Optoelectronic Technology

摘　　要：从传统光学冷加工的原理出发,分析了传统接触式加工方法中抛光剂与材料去除深度的理论关系,设计了微晶玻璃超光滑抛光过程中的抛光剂选型试验。通过比较基片的表面质量,摸索出适合微晶玻璃超光滑抛光的最佳抛光剂为金刚石微粉,成功加工出了超光滑微晶光学元件,其表面粗糙度达到0.2nm。By studying on the principle of the traditional optical cold processing, the theoretical relationship between polis- hing power and the removed depth of material is analyzed. An experiment about ultra-smooth polishing of glass ceramic is designed. By comparing the results of substrate surface quality, the optimal processing parameters of ultra-smooth glass-ce- ramic processing are worked out. The ultra-smooth optical components are successfully fabricated, whose surface roughness could be reach at 0. 2 nm.

关 键 词：微晶玻璃 超光滑表面 抛光 表面粗糙度 

分 类 号：TQ171.684[化学工程—玻璃工业]