利用面形精修技术去除投影物镜中的三叶像差  

Remove Trefoil Aberration of Project Objective Using Lens Surface Re-Polishing Technology

作　　者：赵阳[1] 王平[1] 史振广[1] 谷勇强[1] 刘春来[1] 门树东 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春130033

出　　处：《光学学报》2015年第8期269-274,共6页Acta Optica Sinica

基　　金：国家重大科技专项02专项(2009ZX02005)

摘　　要：极小像差投影物镜中的高阶像差很难通过调节机构消除,是约束像质进一步补偿优化的瓶颈。离子束溅射(IBF)设备广泛应用于光学加工中,能够较好地去除低频和中频误差,实现高精度面形精修。对现有投影物镜小比例验证模型的系统波像差成分进行条纹泽尼克分析,发现存在很大的三叶像差。利用面形精修技术对物镜中的一个表面进行定量精修去除以补偿三叶像差。仿真与实验结果表明,三叶像差得到很好的控制,系统波像差由原来的29.6nm(RMS)减小到12.7 nm(RMS),成像质量得到进一步提升,验证了这种三叶像差补偿方法的正确性和可行性。It is impossible to remove the high order aberrations of minimum aberration project objective only with adjustable structures, which is a bottleneck to restrain further optimization. Ion beam figuring（IBF）instrument is widely used in optical lens manufacturing. IBF can well control low and middle frequency figuring errors to obtain high accuracy figuring polish. The wavefrint error of projection lens small scale model is analyzed using fringe Zernike polynomials, which contains a large amount trefoil aberration. One surfaces of the objective is chosen to remove designated figures using IBF to compensate trefoil aberration of the whole system. Simulation and experiment results show that trefoil aberration is well controlled, and the wavefront error is reduced from 29.6 nm（RMS） to 12.7 nm（RMS）. The quality of objective is greatly improved, which proves the corrextness and applicability of this trefoil aberration compensating method.

关 键 词：几何光学 三叶像差 面形精修 条纹泽尼克多项式 

分 类 号：O435.2[机械工程—光学工程]