上游斜坡对气膜冷却流动影响的实验研究  

Experimental Study on Flow Field of Film Cooling with Upstream Ramp

作　　者：吕骋予 张笑雷[1] 陈冰玉[1] 

机构地区：[1]上海理工大学能源与动力工程学院,上海200093

出　　处：《机械工程与自动化》2015年第5期23-25,共3页Mechanical Engineering & Automation

摘　　要：为了获得气膜孔上游放置斜坡对气膜流场结构的影响规律,利用热膜风速仪测量系统研究了斜坡的台阶高度分别为0.5d和1.0d(d为气膜孔直径)时不同吹风比下沿孔出口中心线下游气流的速度分布和湍流度分布情况,并与常规气膜孔下游流场结构进行对比,以揭示斜坡对气膜冷却流场作用的影响机理。结果表明,带斜坡的气膜冷却结构会降低孔上游的流速并提高孔下游的湍流度。An experiment on flow field and effectiveness of flat-plate film cooling with upstream ramp is made by equipping an hotwire anemometer in the wind tunnel.The heights of the ramps are set as 0.5dand 1.0d（drefers to the diameter of the film cooling hole）.Velocity and turbulence distributions are obtained in the experiment compared with a film cooling hole without upstream ramp so as to show the ramp＇s influence on flow field.Results show upstream ramp contributes to higher turbulence in downstream and lower velocity in upstream.

关 键 词：气膜冷却 上游斜坡 流场 速度场 吹风比 热膜风速仪 

分 类 号：V233.5[航空宇航科学与技术—航空宇航推进理论与工程]