水平式MOCVD反应器分隔进口对化学反应路径和生长均匀性的影响研究  

Effect of Separate-flow Entrance on Chemistry Reaction Pathway and the Uniformity of Growth in Horizontal MOCVD Reactor

作　　者：师珺草[1] 徐楠 左然[3] 赖晓慧 

机构地区：[1]重庆能源职业学院,重庆402260 [2]北京维拓时代建筑设计有限公司,北京100025 [3]江苏大学能源与动力工程学院,镇江212013 [4]福建海峡建筑设计规划研究院,福州350003

出　　处：《材料导报（纳米与新材料专辑）》2015年第1期102-105,共4页

摘　　要：对水平式MOCVD反应器混合进口、分隔进口以及分隔板离衬底不同距离的情况下,反应物浓度分布和生长速率进行数值模拟。在模拟中首先对比混合进口和分隔进口反应器中反应物的浓度分布和生长速率,发现混合进口反应器中,化学反应倾向于加合路径,易于形成纳米颗粒,造成源气体的浪费;而分隔进口反应器中,化学反应倾向于加合物可逆分解的热解路径,减少了气相寄生反应,其生长均匀性优于混合进口式反应器。然后对分隔板长度分别为10cm、6cm和2cm三种不同情况下反应物的浓度分布和生长速率进行模拟,结果发现:当分隔板距离衬底为10cm时,生长均匀性最好,但生长速率较低;而分隔板距离衬底为2cm时,生长速率均匀性略低于前者,但生长速率最大。因此,综合考虑生长速率和生长均匀性,认为分隔板长度为2cm的水平式反应器结构最好。There is a two-dimensional numerical study on concentration distribution and growth rate in the case of mixing-flow entrance and separate-flow entrance and different side splitter lengths in horizontal reactor of MOCVD. In the simulation, the comparison of the mole fraction and growth rate in premixing and unmixed horizontal reactors has done firstly. The result showed that it tends to undergo adduct path in premixed reactor which results in parasitic reactions, while in unmixed reactor it tends to undergo pyrolysis path of adduct and reduces parasitic reactions. The growth uniformity of unmixed reactor is better than the premixing reactor. Then the comparison of the mole fraction and growth rate in side splitter lengths for 10 cm,6 cm and 2 cm were studied. It can be found that the growth uniformity is the best when side splitter lengths is 10 cm, but growth rate is lowest; the growth uniformity of the side splitter lengths for 2 cm is worse than that of 10 cm slightly, but the growth rate is maximal. Taking account of the growth uniformity and growth rate, it can be concluded that the horizontal reactor with side splitter lengths for 2 cm is best.

关 键 词：金属有机化学气相沉积 数值模拟 生长速率 均匀性 

分 类 号：TB43[一般工业技术]