脉冲偏压对复合离子镀(Ti,Cu)N薄膜结构与性能的影响  

Effects of Pulsed Bias on the Structure and Properties of( Ti,Cu)N Coatings Prepared by Hybrid Ion Plating

作　　者：张臣[1] 黄美东[1] 陈泽昊[1] 王萌萌[1] 王宇[1] 

机构地区：[1]天津师范大学物理与材料科学学院,天津300387

出　　处：《表面技术》2015年第10期22-26,共5页Surface Technology

基　　金：天津师范大学创新计划项目(52X09038);天津师范大学大学生创新项目(201510065021)~~

摘　　要：目的 (Ti,Cu)N薄膜是一种新型的硬质涂层材料,关于其结构和性能的研究报道还较少。研究脉冲偏压对(Ti,Cu)N薄膜结构与性能的影响规律,以丰富该研究领域的成果。方法将多弧离子镀和磁控溅射离子镀相结合构成复合离子镀技术,采用该技术在不同脉冲偏压下于高速钢基体表面制备(Ti,Cu)N薄膜。分析薄膜的微观结构,测定沉积速率及薄膜显微硬度,通过摩擦磨损实验测定薄膜的摩擦系数。结果在不同偏压下获得的(Ti,Cu)N薄膜均呈晶态,具有(200)晶面择优取向,当脉冲偏压为-300 V时,薄膜的择优程度最明显。随着脉冲偏压的增加,薄膜表面大颗粒数量减少且尺寸变小,表面质量提高;沉积速率呈现先增大、后减小的趋势,在脉冲偏压为-400 V时最大,达到25.04 nm/min;薄膜硬度也呈现先增大、后减小的趋势,在脉冲偏压为-300 V时达到最大值1571.4HV。结论脉冲偏压对复合离子镀(Ti,Cu)N薄膜的表面形貌、择优取向、沉积速率和硬度均有影响。Objective There are few reports on the microstructure and properties of（ Ti,Cu） N thin film,which is a new type of hard coating. This work investigated the effects of pulsed bias on the structure and properties of（ Ti,Cu） N film,enriching research results of this area. Methods The hybrid ion plating technique,realized by simultaneously using arc ion plating and magnetron sputtering,was employed to deposit（ Ti,Cu） N film samples onto high-speed steel under different pulsed biases. Surface morphology,crystalline structure,thickness,micro-hardness as well as friction coefficient of the coatings were measured respectively.Results All the films were crystalline in spite of the varying bias. The（ Ti,Cu） N coatings deposited at-300 V had the most obvious preferred plane（ 200）. Both the quantity and the size of the macro-particles on the film surface became smaller with the increasing pulsed bias,presenting an improved surface quality. Deposition rate of the（ Ti,Cu） N film increased first and then decreased with increasing pulsed bias,and the maximum deposition rate,25. 04 nm / min,was achieved at a pulsed bias of-400 V.Micro-hardness of the films changed similarly to the deposition rate with the varying pulsed bias,and it reached the maximum value of 1571. 4HV at-300 V. Conclusion The pulsed bias had an obvious influence on the surface morphology,crystalline orientation,deposition rate and microhardness of（ Ti,Cu） N films.

关 键 词：复合离子镀 (Ti Cu)N薄膜 脉冲偏压 表面形貌 结构 力学性能 

分 类 号：TG174.444[金属学及工艺—金属表面处理]