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作 者:王济洲[1] 李宏[2] 熊玉卿[1] 董茂进[1] 张玲[1] 李晨[1]
机构地区:[1]兰州空间技术物理研究所真空技术与物理重点实验室,甘肃兰州730000 [2]环境保护部核与辐射安全中心,北京100082
出 处:《红外与激光工程》2015年第10期3005-3009,共5页Infrared and Laser Engineering
基 金:表面工程技术重点实验室基金(9140C540302120C5401)
摘 要:对一种具有抗静电反红外且在可见及近红外高透过的滤光片进行了研究。采用诱导滤光片的设计理论讨论了膜层厚度及薄膜常数对滤光片透射率及反射区的影响规律,采用离子束辅助沉积方式和磁控溅射的方式对设计膜系进行了制备工艺研究,重点讨论了不同工艺条件下金属层的薄膜常数的变化规律及其对滤光片性能的影响。最终设计的滤光片在750~850 nm谱段具有高达90%以上的透过率、2 500 nm以后谱段反射率高达90%,表面电阻小于300Ω,该滤光片具有很好的抗静电及反红外性能。In order to design one special filter with wide-refection, ZnS and Ag film was chosen as the layers based on the induced transmission filter. The ZnS layers were deposited by Ion Beam Assisted Deposition (IBAD) and treated using ion source deposition, and the Ag layer was deposited by magnetron sputtering. The rate of Ag film with different working parameter was discussed in this paper. At last, the best working parameters were chosen and deposited the induced transmission filter. The results indicate that it has over 90 percents of transmission from 750 nm to 850 nm and more than 90 percents of reflection from 2 500 nm, and the face-resistence is less than 300 Ω. The filter has a good reflection infrared and anlistatig character.
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