磁控溅射Ti-50%Zr合金薄膜不同厚度时的结构  

Structure of Ti-50%Zr Films with Different Thickness Prepared by Magnetic Sputtering Deposition

作　　者：张延志[1] 管卫军[1] 郑黎荣[2] 赖新春[1] 汪小琳[3] 

机构地区：[1]表面物理与化学重点实验室,四川绵阳621907 [2]中国科学院高能物理研究所,北京100049 [3]中国工程物理研究院,四川绵阳621900

出　　处：《材料保护》2015年第10期38-40,57,共4页Materials Protection

基　　金：表面物理与化学重点实验室开放基金(SPC201006)资助

摘　　要：为了研究Ti-Zr合金薄膜厚度对其结构的影响,通过磁控溅射沉积技术在7105载玻片上制备了不同厚度的Ti-50%Zr(原子分数)合金薄膜。利用X射线衍射(XRD)、X射线吸收精细结构谱(XAFS)和X光电子谱(XPS)技术研究了Ti-Zr合金薄膜的晶体结构、元素局域结构和电子结构状态。结果表明,随着Ti-50%Zr薄膜厚度的减小,薄膜由结晶态变为非晶态,薄膜中元素的最近邻原子距离和配位数减小,薄膜中元素的电子结合能逐渐增强。Ti-50%Zr films with different thickness were prepared by magnetic sputtering deposition on 7105 glass slide.The crystal structure,atomic local structure and electron structure of the films were investigated using X-ray diffractometer(XRD),X-ray absorption fine structure(XAFS) and X-ray photoelectron spectroscopy(XPS),respectively.Results showed the crystal structure changed from crystalline state into amorphous state with the decrease of the film thickness.And the distance and coordination number of nearest neighbor atoms were also reduced and the binding energy of Ti and Zr in the films increased with the decrease of the thickness.

关 键 词：Ti-50%Zr合金 薄膜厚度 薄膜结构 

分 类 号：TB306[一般工业技术—材料科学与工程]