活泼金属薄膜法对稀土金属铽中氧含量的影响  

Effect of active metalyttrium film on oxygen concentration in terbium

作　　者：李国玲[1,2] 李里[2] 傅凯[1] 韩丽辉[1] 李星国[2] 田文怀[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083 [2]北京大学化学与分子工程学院稀土材料化学及应用国家重点实验室,北京100871

出　　处：《功能材料》2015年第23期23061-23063,共3页Journal of Functional Materials

基　　金：国家重点基础研究发展计划(973计划)资助项目(2012CBA01207)

摘　　要：通过磁控溅射法在基体金属表面溅射活泼金属层作为吸气剂,在高真空加热条件下,促进间隙杂质氧的脱除。选用活泼金属钇为脱氧剂,可以有效地去除金属铽中固溶的大部分氧元素,氧含量由4.9×10^(-4)降至6.24×10^(-5)。薄膜法是一种特殊的样品制备方法,在脱氧过程中有重要作用。在加热过程中,钇与间隙杂质发生热力学作用,是脱氧的关键。Active metal was deposited on the surface of basic metals as the gas getter,which could promote the removal of oxygen when annealed in vacuum. Yttrium could effectivly remove most of the oxygen in terbium as the external getter,and the oxygen concentration decreased from 4. 9 × 10^(-4) to 6. 24 × 10^(-5). Magnetron sputtering is a kind of specific technology,playing an important role in the degassing process. The thermodynamic interactions between yttrium and interstitial impurities become the key to success.

关 键 词：磁控溅射 铽 钇 氧 

分 类 号：TF841[冶金工程—有色金属冶金]