立方氮化硼膜的研究进展与应用(下)  

Research Progress and Application of c-BN Film

作　　者：殷红[1] 赵艳[1] 

机构地区：[1]吉林大学超硬材料国家重点实验室,吉林长春130012

出　　处：《超硬材料工程》2015年第5期49-52,共4页Superhard Material Engineering

摘　　要：立方氮化硼(c-BN)是一种高硬度、耐辐射、耐腐蚀、抗高温的宽禁带(Eg=6.4eV)多功能材料,因其在机械、电子、物理化学等方面独特的性质,高品质c-BN薄膜、厚膜以及外延生长一直是材料科学等领域的研究热点和难点之一。文章对国内外c-BN薄膜的最新研究进展及多功能性应用等方面进行了系统的综述,提出了c-BN膜工业化亟待解决的基本问题,即结晶度差、内应力高、稳定度低等问题,并且详细介绍了c-BN膜在多功能应用领域里的研究进展。Cubic Boron Nitride （c-BN）is a type of radiation resistant,corrosion resistant and high temperature resistant wide bandgap （Eg=6.4 eV）multifunctional material with high hardness.Due to its unique properties in machinery,electronics and physicochemis-try aspects,high quality c-BN thin film,thick film and epitaxial growth has been one of the research focuses and difficulties in fields like material science.The recent research progress and application of c-BN film in and outside China has been systematically re-viewed in this article and the basic problems which need to be solved for c-BN film indus-trialization,such as the poor crystallinity,high internal stress and low stability,have been presented.Meanwhile,the research progress of c-BN film in multifunctional applica-tion fields has also been introduced in detail.

关 键 词：立方氮化硼 外延生长 综述 刀具涂层 半导体掺杂 表面功能化 

分 类 号：TQ163[化学工程—高温制品工业]