激光直写制备石墨烯研究进展  

Progress in laser direct writing synthesis of graphene

作　　者：南洋[1] 张建寰[1] 张陈涛[1] 

机构地区：[1]厦门大学机电工程系,厦门361005

出　　处：《化工新型材料》2015年第12期1-3,共3页New Chemical Materials

基　　金：留学回国人员科研启动基金(第47批)

摘　　要：石墨烯自从被发现以来由于其特殊的电学、热学、力学等性质引起了极大研究热潮,人们也在不断探索石墨烯制备新方法。激光具有定向发光、能量密度极大、亮度极高等特点,为薄膜制备提供了一种新的研究方向。分析了当前使用的多种制备方法的优缺点,综述了运用激光直接制备图案化石墨烯的各种方法与原理,如激光化学气相沉积法(LCVD)、激光加热非气态碳源法和激光加热SiC法,并对其发展前景进行了展望。Graphene is a fast-growing topic in science and technology in the world because their unique electrical,mechanical,thermal,and optical properties.People are constantly explore new method for preparation of graphene.The laser has many superior characteristics,such as directional light,large energy density,high brightness,and provides a new method for membrane preparation.Based on analysing a variety of synthetic methods of graphene,some new methods of using laser direct synthesis grapheme,such as laser chemical vapor deposition（LCVD）,laser heating solidcarbon source,laser annealing SiC and so on were summarized.In the end,the prospects for its development was forecasted.

关 键 词：石墨烯 激光直写 图案化 制备 

分 类 号：TQ127.11[化学工程—无机化工]