化学气相沉积法制备硅质量分数6.5%硅钢的脆性  

Brittleness of 6.5wt% Si Silicon Steel Prepared by Chemical Vapor Deposition Method

作　　者：高超[1] 苏芳臣 相颖杰 孙权[1] 陈建钧[1] 

机构地区：[1]华东理工大学机械与动力工程学院,上海200237

出　　处：《机械工程材料》2015年第12期12-16,共5页Materials For Mechanical Engineering

基　　金：中央高校基本科研业务资助项目(1114036);上海高校青年教师培养资助计划(YG0142129)

摘　　要：采用化学气相沉积(CVD)法制备了硅质量分数为6.5%的硅钢,利用扫描电镜、能谱仪和自主设计研发的三点压弯机研究了反应温度、气氛含氧量和SiCl_4含量对硅钢脆性的影响。结果表明:硅钢的晶粒尺寸随反应温度的升高而长大,硅钢的脆性随着晶粒尺寸的增加而增大;气氛含氧量在100mg·kg^(-1)时所制备的硅钢产生了晶界氧化现象,使硅钢脆性增加;SiCl_4含量较大时(体积分数35%)所制备的硅钢产生了Kirkendall空洞,导致其脆性加剧。6.5wt% Si silicon steel was prepared by chemical vapor deposition（CVD）method and the effects of reaction temperature,oxygen content in atmosphere and SiCl4 content on the brittleness of 6.5wt%Si silicon steel were studied using SEM,EDS and self-developed three-point bending machine.The results show that the grain size of the silicon steel increased with the reaction temperature rising,and the brittleness of the silicon steel increased with the increase of the grain size.Grain boundary oxidation was observed in the silicon steel when oxygen content in atmosphere was 100mg·kg^-1,which increased the brittleness of the silicon steel.Kirkendall voids were found in the silicon steel with a relatively high SiCl4 content of 35vol%,which increased the brittleness of the steel.

关 键 词：CVD法 硅钢 脆性 晶界氧化 

分 类 号：TB31[一般工业技术—材料科学与工程]