基于巯基-烯材料的亚波长光栅制备方法研究  

Method to Fabricate Subwavelength Grating Based on Thiol-ene

作　　者：张满[1] 邓启凌[1] 李志炜[1] 庞辉[1] 史立芳[1] 曹阿秀[1] 胡松[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《光电工程》2016年第1期65-70,共6页Opto-Electronic Engineering

基　　金：国家自然科学基金资助项目(11174281)

摘　　要：针对亚波长光栅结构和特性要求,本文提出了一种基于巯基-烯材料的亚波长光栅的制备方法。该方法利用柔性的聚二甲基硅氧烷(PDMS)亚波长光栅结构为压印模板,以巯基-烯材料作为压印胶,利用紫外光固化软印刷技术制备以聚甲基丙烯酸甲酯(PMMA)为波导层的巯基-烯材料亚波长光栅。本文对巯基-烯亚波长光栅三层结构进行了模拟仿真,并利用该方法制备了周期为300 nm的巯基-烯亚波长光栅,仿真和实验结果表明该光栅可以在特定角度反射波长为448 nm～482 nm的蓝光,实验现象与仿真结果一致,表明提出的方法可以有效的制备聚合物材料亚波长光栅。同时该方法操作简单、成本低、易于大批量复制,在微纳米结构制备方面具有广阔的应用前景。Based on the special optical properties of the subwavelength grating, a fabrication method of thiol-ene subwavelength grating is presented. An elastic PDMS subwavelength grating was used as the imprint mold and thiol-ene was the imprint resist. Using the UV-curable soft-lithogaphy, thiol-ene subwavelength grating was fabricated, which included a PMMA film as the waveguide layer. The thiol-ene subwavelength grating with the period of 300 nm was stimulated and fabricated using this method. The experimental results show that the thiol-ene subwavelength grating could reflect the blue light with wavelength ranged from 448 nm-482 nm at a specific angle, which were consistent with the simulation results. The results indicate that the method proposed in this article could effectively fabricate the subwavelength grating structure. Furthermore, the method is simple, low-cost, and easy to high throughput, which has broad application prospects in the preparation of micro and nano structures.

关 键 词：亚波长光栅 巯基-烯材料 PDMS 紫外光固化软印刷技术 PMMA 

分 类 号：TN303[电子电信—物理电子学] TN253