磁控溅射沉积气致变色WO_3薄膜研究进展  

Progress in Gasochromic WO_3 Thin Films Deposited by Magnetron Sputtering

作　　者：温佳星 王美涵[1] 彭洋[1] 王新宇[1] 侯朝霞[1] 王少洪[1] 胡小丹[1] 

机构地区：[1]沈阳大学机械工程学院,辽宁沈阳110044

出　　处：《中国材料进展》2016年第1期57-63,共7页Materials China

基　　金：国家自然科学基金青年基金(51302175);辽宁省优秀人才支持计划(LJQ2014132);2015年国家人社部留学人员科技活动项目择优资助

摘　　要：氧化钨薄膜因其特殊的物理化学性质,在智能窗、传感器等诸多新领域具有广泛的应用前景。为使WO_3薄膜气致变色特性得到良好的应用,需要制备新型纳米结构氧化钨薄膜。磁控溅射是工业制备WO_3薄膜的有效方法之一。掠射角磁控溅射是在传统磁控溅射基础上发展的新型薄膜制备技术,通过将衬底倾斜一定角度,可制备出具有高结晶度、大比表面积、排列规则的纳米结构WO_3薄膜。综述了氧分压、溅射功率及热处理等磁控溅射参数对WO_3薄膜组成、形貌、晶体结构等的影响,重点介绍了具有独特优势的掠射角磁控溅射技术,及利用其制备得到的纳米结构WO_3薄膜在智能窗和气体传感器等方面的应用,提出了掠射角磁控溅射制备纳米结构WO_3薄膜存在的问题及未来发展趋势。Tungsten oxide thin films have wide applications in the fields of smart windows and sensors due to their special physical and chemical properties. To make tungsten oxide thin films with gasochromie property in practical applications, novel nanostructured WO3 thin films are needed to be produced. Magnetron sputtering is an effective method to produce WO3 thin films in industry. Glancing angle magnetron sputtering deposition is a new technology which is developed based on traditional magnetron sputtering, and it is used to deposit high crystalline, large surface area and well-ordered nano- structured WO3 thin films by inclining the substrate to a certain angle. In this paper, the effects of magnetron sputtering parameters, including oxygen partial pressure, annealing temperature and deposition power on the composition, morphology and crystal structure of WO3 thin ~dms are summarized. The unique advantages of glancing angle magnetron sputtering are emphasized. The applications of nanostructured tungsten oxide thin films on smart windows and gas sensors are introduced. Finally, the problems inhered in glancing angle magnetron sputtering deposition of tungsten oxide thin films and its future developments are proposed.

关 键 词：WO3薄膜 磁控溅射 掠射角 纳米结构 气致变色 

分 类 号：TB381[一般工业技术—材料科学与工程]