抛光液酸碱性对固结磨料抛光硫化锌晶体的影响  

Influence of Different Acid and Alkaline Slurry on Fixed Abrasive Polishing of Zinc Sulfide Crystal

作　　者：黄建东[1] 李军[1] 宋龙龙[1] 花成旭 胡章贵[2] 朱永伟[1] 左敦稳[1] 

机构地区：[1]南京航空航天大学机电学院,南京210016 [2]中国科学院理化技术研究所中国科学院功能晶体与激光技术重点实验室,北京100190

出　　处：《人工晶体学报》2016年第2期304-308,共5页Journal of Synthetic Crystals

基　　金：国家自然科学基金(51175260);航空基金(2015ZE52056);中国博士后科学基金(2014M551586);江苏省博士后科研资助计划(1302069B);南京航空航天大学研究生创新基地(实验室)开放基金项目(kfjj20150508)

摘　　要：硫化锌晶体是一种重要的红外光学材料,在红外成像、导弹制导、红外对抗等红外技术领域应用广泛。抛光液能够与工件及抛光垫发生化学反应从而影响工件表面质量和材料去除率。实验采用乙二胺、氢氧化钠、柠檬酸、盐酸分别配制不同的酸碱性抛光液,研究抛光液酸碱性对固结磨料抛光硫化锌晶体材料去除率、表面形貌和表面粗糙度的影响。实验结果表明:酸性抛光液抛光的材料去除率高于碱性抛光液;柠檬酸抛光液可同时获得优表面质量和高加工效率,抛光后的晶体表面粗糙度Sa值为4.22 nm,材料去除率为437 nm/min。Zinc sulfide crystal is an important infrared material,which is widely used in the field of infrared imaging,missile guidance,infrared countermeasure and so on. Slurry can affect the wafer surface quality and material removal rate（ MRR） by chemical reaction with workpiece and polishing pad. Ethylenediamine（ EDA）,sodium hydroxide,hydrochloric acid,citric acid was adopted to prepare slurry,respectively.Material removal rate,surface roughness and surface morphology were investigated in fixed abrasive polishing of zinc sulfide crystal. The results indicate that MRR can be obtained higher by acid slurry than that of alkaline slurry. Citric acid slurry is effective for fixed abrasive polishing of zinc sulfide crystal,obtaining a fine surface quality with surface roughness Sa of 4. 22 nm and high MRR of 437 nm / min.

关 键 词：抛光液 硫化锌 固结磨料抛光 表面粗糙度 材料去除率 

分 类 号：O786[理学—晶体学] TH161[机械工程—机械制造及自动化]