双靶直流溅射多层膜的叠加结构对沉积扩散法制备高硅钢硅含量的影响  

Fabrication of High-Si Steel by Vacuum Thermal Diffusion of Sputtered Fe-Si Multilayers

作　　者：马海林[1] 刘曦[2] 夏荣斌[1,3] 田广科[1] 

机构地区：[1]兰州交通大学国家绿色镀膜技术与装备工程技术研究中心,兰州730070 [2]兰州交通大学光电技术与智能控制教育部重点实验室,兰州730070 [3]常州大成绿色镀膜科技有限公司,常州213022

出　　处：《真空科学与技术学报》2016年第2期154-158,共5页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金资助项目(51461028);国家科技支撑计划(2014BAF01B02)

摘　　要：以低硅钢片为基底(Fe-3%质量比Si),采用双靶直流共焦溅射不同叠加结构的硅-铁多层膜系(Fe-Si),然后在高真空下热扩散处理2 h得到高硅钢。研究了交替沉积、叠加周期性结构多层膜对热处理扩散硅含量的影响。用X射线衍射对样品进行物相分析,得出不同硅铁合金相(Fe-Si)的形成强烈依赖于前期膜沉积结构,周期性交替沉积Fe、Si膜时更有利于形成硅铁B2、DO_3相结构。用扫描电镜及能量散射谱观察了样品的断面微观形貌并测定硅含量沿断面深度分布关系,发现硅含量始终在断面中心低、两边高,且不同叠加结构膜系下的样品硅含量也不一样,选择合适的Fe、Si交替沉积膜系有利于硅的扩散。分别测量了不同叠加结构膜系下样品的电阻率、密度、断面显微硬度值,结果显示硅含量越高电阻率约大、硬度越高、密度越小。The high-Si steel,Fe-6.5%Si,was synthesized by vacuum thermal diffusion of the Fe-Si multilayers deposited by DC magnetron alternative sputtering of Fe and Si targets on the top and bottom surfaces of the low-Si steel（Fe-3.0%Si）.The impact of the Fe-Si multilayers,including but not limited to the period,thickness of Fe and Si layers and annealing temperature,on the phase-structure,Si depth-profile,interfacial adhesion,hardness and resistivity,was investigated with X-ray diffraction,scanning electron microscopy,energy dispersive spectroscopy and conventional surface probes.The preliminary results show that the thermal diffusion of the substrate,coated with[Fe（400 nm）/Si（2 μm）]（10）multilayers on both sides,increased the non-uniform Si-content up to 6.7%,without peeling-off and/or cracking of the Fe and/or Si layers.The top-down and bottom-up decreases of the Si-content were observed.Moreover,a higher Si-content resulted in a higher resistivity,a stronger hardness and a lower density.

关 键 词：多层膜 高硅钢 磁控溅射 热处理 

分 类 号：TF637[冶金工程—钢铁冶金]