径流分子泵在多弧离子镀膜设备的最新应用  

THE NEW APPLICATIONG OF RADIAL MOLECULAR PUMPS(RMP)ON ARC ION PLATING COATERS

作　　者：张永胜 储继国[2] 

机构地区：[1]亚智系统科技(苏州)有限公司,江苏苏州215011 [2]深圳大学,深圳518060

出　　处：《真空与低温》2016年第2期111-113,共3页Vacuum and Cryogenics

摘　　要：通过对新开发问世的径流分子泵进行介绍,其独特抽气特性,为多弧离子镀的工艺优化提供了理论依据。传统多弧离子镀的抽气工艺和镀膜工艺,是在扩散泵和涡轮分子泵抽气能力的制约下总结出来的。径流泵机组的问世,为多弧离子镀膜提供了更加宽广的镀膜工艺选择空间。这样就有必要对抽气工艺和镀膜工艺进行重组和优化,进一步提升多弧离子镀膜设备的性能和经济效益。This paper introduces the newly developed radial molecular pump(RMP). The theory of process optimiza-tion is based on the special pump curve. The pump process and the coating process were developed according to restricted diffusion pumps and the TMPs. After the RMP is developed,it can extend the process windows for arc ion plating coating. It is necessary to optimize the pump process and the coating process to make the coater performance better.

关 键 词：多弧离子镀 径流分子泵 镀膜工艺 抽气特性 

分 类 号：O484[理学—固体物理]