应用离子束修正高精度CGH基底  

High-precision CGH substrate figuring by ion beam

作　　者：马占龙[1] 彭利荣[1] 王高文[1] 谷勇强[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室超精密光学工程研究中心,吉林长春130033

出　　处：《中国光学》2016年第2期270-276,共7页Chinese Optics

基　　金：国家科技重大专项项目(No.2009ZX02205)~~

摘　　要：计算全息图(CGH)作为零位补偿器广泛应用于高精度非球面的检测中,但CGH的基底误差直接限制了非球面的检测精度。为了获得超高精度的CGH基底,提出了应用离子束修正CGH基底的加工工艺。采用不同束径的离子束去除函数对一边长152 mm(有效口径140 mm圆形区域)、厚6.35 mm的正方形熔石英CGH基底分别进行了精抛、精修和透射波前修正实验。经过总计7轮的迭代修正,最终获得了透射波前为PV值20.779 nm、RMS值0.685 nm的超高精度CGH基底。实验结果表明:应用离子束修正高精度CGH基底的加工工艺具有较大优势,不仅具有较高的加工效率而且可以获得超高的加工精度。Computer-generated hologram（ CGH） is widely applied in the high-precision testing of asphere as high-accuracy null compensator,but the surface figure error of CGH substrate directly restricts the testing precision. In order to gain ultra-precision CGH substrates,the figuring of high-precision CGH substrates by ion beam is presented. A square fused silicon CGH substrate with 152 mm side length（ 140 mm valid aperture）and 6. 35 mm thickness is figured by different scale IBF removal functions. Through seven iterations,an ultraprecision CGH substrate with transmitted wavefront PV value 20. 779 nm and RMS value 0. 685 nm is gained finally. The experiment result shows that figuring high-precision CGH substrates by ion beam has notable advantage,and it has not only high process efficiency but also ultra-high process precision.

关 键 词：光学制造 离子束 计算全息图 透射波前 

分 类 号：TH161[机械工程—机械制造及自动化] TQ171.6[化学工程—玻璃工业]