MPM-700光学零件抛光平台的研制与改进  

The Design and Technical Improvements of the MPM-700 Optical Accessory Polishing Machine

作　　者：杨师[1] 李嘉浪 张世崇[1] 熊朋[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2016年第4期25-28,59,共5页Equipment for Electronic Products Manufacturing

摘　　要：论述了用于激光陀螺仪、旋光片抛光的MPM-700光学零件抛光平台的主要结构及特点。介绍了该设备在传动方式、台面选型优化、抛光头装载结构方面较原PG-710抛光设备的技术改进;并通过运用有限元软件对该抛光平台架进行受载情况仿真,消除了抛光过程中抛光盘变形对抛光效果的影响,进而在理论和实践两个方面确定了该设备已达到设计要求。This article introduces the configuration and characteristic of the MPM-700 Optical Accessory Polishing Machine used for ultra-planarization of the gyroscope. Describes the technical Improvements on the transmission, the polishing table and the structure of polishing head. and than carries the emulation of fixed bracket under pressure, through solidworks software, removes the affect of fixed bracket to orientation and loading effect, consequently, it confirms that this equipment has achieved design require basically from theory and practice.

关 键 词：光学零件 超精密抛光 抛光头 

分 类 号：TN305.2[电子电信—物理电子学]