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机构地区:[1]武汉大学口腔医学院口腔基础医学省部共建国家重点实验室培育基地和口腔生物医学教育部重点实验室,湖北武汉430079 [2]武汉大学口腔医院口腔颌面外科,湖北武汉430079 [3]武汉大学口腔医院修复科,湖北武汉430079
出 处:《口腔医学研究》2016年第4期356-360,共5页Journal of Oral Science Research
基 金:国家自然科学基金(编号:81371191)
摘 要:目的:研究不同能量密度下Nd:YAG激光照射对牙本质粘接强度的影响。方法:36颗无龋第三磨牙去除冠方牙釉质,随机分为3组:对照组低能量密度激光照射组(1W,85J/cm2)和高能量密度激光照射组(4W,350J/cm2)。每组牙再随机分为两个亚组,分别使用全酸蚀(Single Bond 2)或自酸蚀粘接剂(G-Bond)进行粘接以及树脂修复。进行微拉伸粘接强度测试,扫描电镜观察牙本质表面形貌及粘接界面纳米渗漏情况。激光扫描共聚焦荧光显微镜下观察粘接界面树脂突形态及数量。结果:全酸蚀粘接中,低密度激光照射对粘接强度无影响,高密度激光照射后粘接强度相比对照组降低(P<0.05);自酸蚀粘接中,低密度激光照射后粘接强度比对照组显著下降(P<0.05),高密度激光照射对粘接强度无影响。低密度激光照射不增加粘接界面纳米渗漏,高密度激光照射后样本纳米渗漏相比对照组均显著增加(P<0.05)。结论:低能量密度的激光照射后使用全酸蚀粘接系统粘接效果较好;高能量密度的激光照射后使用自酸蚀粘接系统效果较好。Objective:To evaluate the effect of different energy densities of Nd:YAG laser irradiation on the dentin bond strength.Methods:Thirty-six intact third molars were randomly divided into three groups after the enamel were removed,The three groups are control group,low energy density group(1w,85J/cm2)and high energy density group(4w,350J/cm2).After the corresponding surface treatment,each group was divided into two subgroups in order to evaluate the bonding strength of both self-etching adhesive(G-Bond,GC)and total etch adhesive(Single Bond 2,3M ESPE).The dentin surfaces were observed by SEM and LSCM.Results:After irradiated by low energy density laser,the bonding strength of total etch adhesive was stable and that of self-etch adhesive decreased.However,after high energy density laser irradiation,the bonding strength of self-etch adhesive was maintained and that of total etch adhesive decreased.Conclusion:After low energy density laser irradiation,total etch adhesive will get more stable dentin bond strength.While after high energy density laser irradiation,self-etch adhesive will be better.
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