光学光刻设备发展和展望  

Development and Prospect of optical lithography equipment

作　　者：李立文[1] 

机构地区：[1]杭州士兰集成电路有限公司,浙江杭州310000

出　　处：《电子测试》2016年第5期125-125,121,共2页Electronic Test

摘　　要：在半导体技术和制造的发展中,半导体加工技术中最为关键的光刻技术和光刻工艺设备,必将发生显著的变化,本文将对光刻技术和光刻设备的发展历史进行简述,并展望未来光刻技术的趋势。In the development of semiconductor technology and manufacturing,semiconductor processing technology in the most critical lithography and lithography process equipment,will have significant change, this article will for lithography and briefly describes the development history of lithography equipment, and looking forward to the future trend of lithography.

关 键 词：光学光刻 设备 发展 

分 类 号：TN305.7[电子电信—物理电子学]