强流脉冲电子束辐照TiN薄膜表面形貌与性能研究  

Surface Microstructures and Mechanical Properties of TiN Coatings Irradiated by High Current Pulsed Electron Beam

作　　者：姜巍[1] 王浪平[1] 王小峰[1] 

机构地区：[1]哈尔滨工业大学材料科学与工程学院哈尔滨工业大学先进焊接与连接国家重点实验室,哈尔滨150006

出　　处：《真空科学与技术学报》2016年第5期573-577,共5页Chinese Journal of Vacuum Science and Technology

摘　　要：利用强流脉冲电子束对Ti N薄膜进行辐照处理。辐照加速电压25 k V,辐照能量密度5 J/cm2,脉冲次数10,20次。使用扫描电镜观察强流脉冲电子束辐照后薄膜表面与截面形貌,原子力显微镜测试薄膜表面粗糙度,X射线衍射测试表面物相组织,划痕仪、纳米硬度计和摩擦试验机测试薄膜机械性能。研究表明:强流脉冲电子束辐照后,Ti N薄膜表面发生了重熔,薄膜表面粗糙度增加,薄膜的物相组织、纳米硬度和摩擦系数没有发生明显变化。强流脉冲电子束辐照可以增加薄膜与基体的结合力,从7.4增加到15 N。The surfaces of the Ti N coatings,synthesized by plasma immersion ion implantationand deposition onsubstrate of GCr15 bearing steel,were modified by irradiation of high current pulsed electron beam（ HCPEB）.The impact of the modification conditions,including but not limited to the acceleration voltage,energy density of electron beam and pulse number,on the microstructures and mechanical behavior of the Ti N coatings were investigated with X-ray diffraction,scanning electron microscope,atomic force microscope,and conventional mechanical probes. The results show that the HCPEB irradiation melted the Ti N coatings and strongly increased the surface roughness and Ti N / substrate interface adhesion;but weakly affected the phase-structures and mechanical / tribological properties. For example,The HCPEB irradiation,at 25 k V and 5 J / cm2 for 10 pulses and / or 20 pulses,increasedthe interfacial adhesion and surface roughness of the Ti N coatings from 7. 4 to 15 N and from 8. 5 to 14. 5nm,respectively.

关 键 词：强流脉冲电子束 TIN薄膜 表面粗糙度 纳米硬度 结合强度 

分 类 号：O484[理学—固体物理]