多晶硅薄膜生产中的硅酸乙酯源柜温度与流量控制  

Temperature and flow control of TEOS source tank in polycrystalline-silicon thin film production

作　　者：王志伟[1] 赖永波[1] 陆锦军[1] 

机构地区：[1]江苏信息职业技术学院,江苏无锡214153

出　　处：《现代电子技术》2016年第12期103-106,共4页Modern Electronics Technique

基　　金：国家自然科学基金(60974016);江苏省科技厅前瞻性产学研研究专项基金资助项目(BY2013016);江苏省自然科学基金(BK2008188)

摘　　要：多晶硅薄膜生产中的硅酸乙酯(TEOS)源柜是集成电路制造扩散工艺中的重要设备,其供应源气的温度与流量控制是多晶硅薄膜生产的关键技术之一。针对TEOS源柜温度与流量控制,采用西门子可编程序控制器模块(S7-300PLC)构建硬件系统和专家PID控制策略,通过人机一体化(HMI)的用户控制操作界面,实现快速精准控制输出源气的温度与流量。实践表明,设计的控制系统运行稳定,流量控制满足设计生产指标,且温度控制误差精度在0.5%内,达到业内生产控制先进技术水平。The TEOS source tank in polycrystalline-silicon thin film production is an important equipment of diffusion technology for integrated circuit manufacture,and its temperature and flow control of supply source gas is one of the key technologies in polycrystalline-silicon thin film production. For the temperature and flow control of TEOS source tank,the programmable controller module S7-300 PLC made by Siemens is used to construct the hardware system and expert PID control strategy. The user controlled operation interface with human-machine integration（HMI）is used to rapidly and accurately control the temperature and flow of output source gas. The designed control system has stable operation. In this system,the flow control can satisfy the design requirement of production index,and the error precision of the temperature control is within 0.5%. The system has reached the advanced level of production control.

关 键 词：TEOS源柜 温度与流量控制 专家PID控制 集成电路制造 

分 类 号：TN386.34[电子电信—物理电子学]