Al掺杂量对N-Al共掺ZnO薄膜光学性能的影响  

Effect of Al-doped on optical properties of N-Al co-doped ZnO thin films

作　　者：王玉新[1] 刘奇[1] 刘子伟[1] 孙景昌[1] 王晓玉[1] 张巍[1] 陈苗苗[1] 

机构地区：[1]辽宁师范大学物理与电子技术学院,辽宁大连116029

出　　处：《辽宁师范大学学报（自然科学版）》2016年第2期181-185,共5页Journal of Liaoning Normal University:Natural Science Edition

基　　金：辽宁省教育厅科学研究一般项目(L2015292)

摘　　要：利用超声喷雾热解方法以不同的Al掺杂量在石英衬底上制备了N-Al共掺ZnO薄膜,并对其光学性能进行了研究.采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、紫外可见分光光度计(UV)和光致发光谱(PL)表征了样品的晶体结构、表面形貌、透过率和光致发光性能.结果表明:所制备薄膜具有较高光学质量,并且Al掺杂量对N-Al共掺ZnO薄膜的光学性能有很大影响,当n(Zn)∶n(N)∶n(Al)=1∶3∶0.12时,UV光谱的吸收边蓝移最多,带隙展宽最大.PL谱测试结果显示此样品近带边紫外发光峰蓝移至384.9nm.N-Al co-doped ZnO thin films were successfully prepared on spray pyrolysis method with different Al content. The optical proper quartz substrates by ultrasonic ties of the samples were stud- ied. Structural, morphological, transmission and photoluminescence properties of AZO thin films were investigated by X-ray diffraction （XRD）, scanning electron microscopy （SEM）, UV-Vis spectro- photometer （UV spectroscopy ） and photoluminescence （PL）. Experimental results show that all the deposited films have better optical properties, and the Al doping concentration has significantly effects on optical properties. According to the UV-Vis spectra,the transmittance cut-off wavelengths （λcutoff） exhibited the most blue shift and the widen optical band gap （Eopt） when Zn： N： Al=1： 3 ： 0.12. At the same time, the near-band edge ultraviolet emission peak is observed at 384. 9 nm in room temperature photoluminescence spectra.

关 键 词：氧化锌薄膜 超声喷雾热解 N-Al共掺 透过率 光致发光谱 

分 类 号：O484.1[理学—固体物理]