ANSYS在CCD器件温度场仿真中的应用  

Simulation on CCD Temprature Field by Using ANSYS

作　　者：王景福[1] 赵肖楠[1] 宋林森[1] 

机构地区：[1]长春理工大学

出　　处：《工具技术》2016年第7期100-103,共4页Tool Engineering

摘　　要：根据CCD器件的特点及实际工作环境,建立其在脉冲激光辐射下温度场的仿真数学模型。利用ANSYS软件APDL语言实现CCD器件参数化建模的全过程,完成CCD器件温度场的数值模拟,得到不同时间段脉冲激光辐射下的温度场分布和温升曲线。According to the characteristics of the CCD device and its actual working environment,it establishes math- ematical model of temperature field simulation under pulse laser radiation. Using the ANSYS software and APDL language, the parametric modeling process of optical element is completed. It also has completed numerical simulation of the tempera- ture field of optical element CCD image sensor. And obtained the temperature field distribution and temperature rise curves under pulse laser radiation.

关 键 词：光学元件 CCD器件 脉冲激光 温度场 仿真 

分 类 号：TG665[金属学及工艺—金属切削加工及机床] TH741[机械工程—光学工程]