直流反应溅射WO3薄膜的结构及光催化性能研究  

Studies on the structure and photocatalytic activity of WO_3 thin films prepared by DC reactive magnetron sputtering

作　　者：朱海玲[1] 唐艳艳[1] 

机构地区：[1]潍坊学院物理与光电工程学院,山东省重点实验室,山东潍坊261061

出　　处：《功能材料》2016年第8期8164-8168,共5页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(61306152);山东省自然科学基金资助项目(ZR2010EQ001);潍坊学院青年科研基金资助项目(2012Z15)

摘　　要：采用直流反应磁控溅射法,在石英基片上沉积WO_3薄膜,考察了溅射参数对WO_3薄膜结构及其性能的影响,并通过后续热处理得到不同物相结构的薄膜,分析探讨薄膜光致变色与光催化性能间的内在关联。利用XRD、SEM、UV-Vis和UV-Vis-Nir分别对WO_3薄膜的晶型、表面形貌、光学特征及光催化等性能进行分析与表征,实验结果表明,反应溅射氧氩比不同时,WO_3薄膜的光致变色效果不同,变色效果越好的薄膜光催化活性越高;热处理导致WO_3薄膜光致变色特性的消失和光催化活性的降低,未处理得到的非晶态WO_3具有最好的光催化活性。WO_3 thin films were deposited by DC reactive magnetron sputtering on the quartz substrate,and the structure and properties of WO_3 thin films were studied at different DC-sputtering parameters.Different phase structures of the WO_3 thin films were obtained after heat treatment at different temperature.The inherent links and the functioning mechanism between photocatalysis and photochromism were investigated.The structure,morphology,optical property and photocatalytic activity of WO_3 thin films were characterized through XRD,SEM,UV-Vis and UV-Vis-Nir,respectively.The WO_3 thin films present varied photochromic efficiency at different oxygen argon ratio,and the highest photocatalytic activity of WO_3 thin films presented the best photochromism.Both photochromism and the photocatalytic property degraded after heat-treatment,and the catalysts activity of WO_3 thin film unheated was better than that of the heated one.

关 键 词：WO3 磁控溅射法 光催化 光致变色 

分 类 号：TB34[一般工业技术—材料科学与工程] TB43