溅射金膜修饰玻片电极检测六价铬  

Gold-sputtered Plate-type Glass Electrode for Determination of Chromium(Ⅵ)

作　　者：王婉[1] 李海玉[1] 王志娟[1] 吕庆[1] 张庆[1] 

机构地区：[1]中国检验检疫科学研究院,北京100176

出　　处：《分析测试学报》2016年第8期1050-1053,共4页Journal of Instrumental Analysis

基　　金：质检公益性行业科研专项计划项目(201510023);中国检科院基本科研业务专项基金项目(2014JK005)

摘　　要：采用离子溅射技术制备了一种新型金膜修饰片状玻璃电极。线性扫描伏安分析表明六价铬在该电极上具有良好的电化学响应。通过优化溅射时间、溅射电流、电解质等参数,得到线性扫描伏安法的检出限（S/N=3）为6.5μg/L,安培法的检出限为2.0μg/L。电极批间重现性为9.2%（n=10）,同批次电极间的重现性为9.2%～25.8%（n=10）。该电极制备过程简单,成本低,可实现批量制备。应用该电极对塑料及湖水中的六价铬含量进行检测,结果与HPLC-ICP-MS测定值基本一致。A novel plate-type glass-supported gold-film electrode was tabricated by means of ion sput- tering. Cr（Ⅵ） could be electrochemically reduced at the proposed electrode. After optimization of parameters, including sputtering time, current and supporting electrolyte, Cr（Ⅵ） could be deter- mined using either linear sweep voltammetry with a detection limit（S/N = 3） of 6.5μg/L or amper- ometry with a detection limit of 2.0 μg/L. The batch-by-batch reproducibility （n = 10） was 9.2% and the electrode-by-electrode reproducibility （n = 10） in same batch ranged from 9.2% to 25.8% . The proposed electrode is easy-to-fabricate and economical, and is available for mass production. The method was applied in the determination of Cr（ Ⅵ） in real samples including plastic and lake wa- ter, and the results were consistent with those obtained by the HPLC -ICP- MS method.

关 键 词：离子溅射 金膜电极 六价铬 线性扫描伏安法 安培法 

分 类 号：O657.1[理学—分析化学] O614.61[理学—化学]