脉冲峰值电流对HIPIMS/DCMS共沉积制备AlCrTiN涂层性能的影响  

Effects of Peak Target Current on Properties of AlCrTiN Coatings Prepared by HIPIMS/DCMS

作　　者：贵宾华 周晖[1] 郑军[1] 张延帅[1] 杨拉毛草 

机构地区：[1]兰州空间技术物理研究所真空技术与物理重点实验室,兰州730000

出　　处：《中国表面工程》2016年第5期56-65,共10页China Surface Engineering

摘　　要：利用HIPIMS与DCMS共沉积技术制备AlCrTiN复合硬质涂层,通过调控Al Cr靶脉冲峰值电流来制备不同峰值电流下的AlCrTiN涂层。采用XRD、SEM等分析手段表征不同峰值电流下AlCrTiN涂层的组织结构及微观形貌;通过纳米压痕、真空退火、高温摩擦磨损试验分析涂层的力学性能、热稳定性能及摩擦学性能。结果表明:AlCrTiN涂层为典型的面心立方结构,随峰值电流的增加,(111)及(200)晶面呈现竞争生长的状态;随真空退火温度上升,各涂层硬度值出现明显下降。1 000℃退火后,各涂层硬度维持在17 GPa附近;随摩擦环境温度的上升,各涂层摩擦因数整体呈下降趋势;280 A所制备涂层因高温抗氧化性能及磨屑排出能力的不足导致其高温磨损率迅速增加,800℃下其磨损的主要形式为氧化磨损和粘着磨损。The AlCrTiN coatings were deposited by a hybrid coating system with high power impulse magnetron sputtering （HIPIMS） and DC magnetron sputtering （DCMS）. The influence of peak target current on the microstructure and high temperature tribological properties were studied. X-ray diffraction （XRD） and scanning electron microscope （SEM） were used to study the microstructure and micrograph of the coatings. The mechanical properties and therrnostability were evaluated by nano-indentation, vacuum annealing and ball-on-disc tribo-test. The results indicate that the AlcrriN coatings present a typical face-centred cubic structure and the competitive growth between the （111） and （200） crystal planes is observed with the increase of peak target current. The hardness gradually decreases with the increase of the vacuum annealing temperature, and at 1 000 ℃, the hardness of the coatings remaines at 17 GPa approximately. The coefficient friction decreases with the elevation of the temperature. Due to the insufficient of oxidation resistance at high temperature and the poor capacity in debris removal, the high temperature wear rate of the coatings deposits at 280 A increases rapidly, and the wear mechanical is oxidative wear and adhesive wear at 800 ℃.

关 键 词：高功率磁控溅射 直流反应磁控溅射 共沉积 组织结构 力学性能 耐磨性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]