变形镜在激光辐照下热畸变有限元模拟  

Finite element simulation of thermal distortions of deformable mirror with laser irradiation

作　　者：张耀平[1,2] 樊峻棋[1,2] 龙国云[1,2] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209 [2]中国科学院自适应光学重点实验室,四川成都610209

出　　处：《红外与激光工程》2016年第11期56-60,共5页Infrared and Laser Engineering

基　　金：国家高技术研究发展计划

摘　　要：利用有限元分析软件数值模拟了固体激光器系统中由单晶硅(Silicon)、石英(Silica)与超低膨胀玻璃(ULE)等不同材料制作的变形反射镜受激光辐照下的热畸变特性。计算结果表明:当入射激光功率密度为0.225 k W/cm^2,激光照射时间为10 s,镜面反射率为99.9%时,三种材料的变形镜的最大温升分别为0.804、6.751与7.122℃,最大热变形分别为0.049 3、0.034 8与0.005 4μm,相比之下,单晶硅温升较小,超低膨胀玻璃(ULE)的变形与应力最小,ULE是未来比较理想的镜面材料。最后,对变形镜在长脉冲激光辐照下也进行了计算与分析。The thermal distortions of deformable mirror with such materials as mono-crystalline silicon, silica and nucleated glass （ULE）, irradiated with diode-pumped solid-state laser （DPL） were calculated and analyzed using FEA software. The results show that when the power density of input laser is 0.225 kW/cm^2, and the reflectivity of the deformable mirror thin film are 99.9%, the temperature rising and thermal distortions of the deformable mirror are separately 0.804, 6.751 and 7.122℃, and 0.049 3, 0.034 8 and 0.005 4μm respectivel, under the radiation time of 10 seconds. By comparison, the temperature rising of deformable mirror with mono-crystalline silicon substrate is smaller; the deformation and stress of ULE is the lowest, which would be a kind of more promising material for producing deformable mirror in future DPL laser system. In the end, some results of the long pulse laser irradiation were calculated and analysis.

关 键 词：自适应光学 变形镜 激光薄膜 有限元分析 

分 类 号：O484.1[理学—固体物理]