水平内移距离对种植体及其周围骨组织应力分布影响的有限元研究  

Stress distribution of platform switching implant with different mismatch sizes on implant system and marginal bone tissue

作　　者：陈志飞[1] 顾卫平[1] 刘斌[2] 陈岗[1] 孙佳麒[1] CHEN Zhifei GU Weiping LIU Bin CHEN Gang SUN Jiaqi(Jiangsu Key Laboratory of Oral Diseases, Nanjing Medical University, Department of General Dentistry, Affiliated Hospital of Stomatology, Nanjing Medical University, Nanjing 210029, China)

机构地区：[1]南京医科大学口腔疾病研究江苏省重点实验室,南京医科大学附属口腔医院综合科,江苏南京210029 [2]南京航空航天大学振动工程实验室,江苏南京210029

出　　处：《口腔医学》2016年第11期984-988,共5页Stomatology

基　　金：江苏高校优势学科建设工程资助项目(2014-37)

摘　　要：目的采用三维有限元分析法,比较平台转移种植体不同水平内移距离对种植体及周围骨组织应力分布的影响。方法以Ankylos C/X4.5 mm×11 mm种植系统为参照,利用Mimics、Solidworks及Patran有限元分析软件,建立平台转移种植体水平内移距离分别为0.0、1.0、1.5、2.0 mm 4组模型,对每个模型分别进行垂直和斜向加载,分析边缘骨组织以及种植体基台的应力分布情况。结果两种载荷下平台转移组(PS)骨组织等效应力峰值均小于平台对接组(PM),随着水平内移距离增加,种植体-骨界面应力峰值减小,但当差异值增加到一定程度时(2.0 mm),种植体周骨组织等效应力峰值有增加趋势。结论平台转移种植体水平内移距离增加对减少边缘骨组织应力有积极影响,但当种植体与基台直径差距过大时,仍有应力集中的趋势。Objective To analyze the influence of platform switching with different implant-abutment mismatch sizes on the stress distribution of the implant system and bone tissue. Methods Based on the Ankylos implant system（ Ankylos C / X 4. 5 mm × 11mm）,four 3D finite element models were simulated by using Mimics,Solidworks,and Patran software,with both vertical and oblique load on each model. The implant-abutment mismatch sizes of different models were 0. 0,1. 0,1. 5,2. 0 mm respectively. The Von Mises stress and the trend of stress distribution were analyzed in each model. Results Compared with the platform-matched implant,the group of platform-switched implant had a lower maximum Von Mises stress in the periimplant bone. With the increase of mismatch size,the stress concentration in the cortical bone was found to decline. However,when the mismatch size was no less than 2 mm,the stress concentration in cortical bone was observed to show an increased tendency. Conclusions The amplitude of horizontal mismatch may have a positive effect on the reduction of the stress concentration on implant-bone interface. On the contrary,there is an increasing tendency in the stress concentration with the excessive increase of mismatch size.

关 键 词：平台转移 种植体 水平内移距离 三维有限元 

分 类 号：R782.12[医药卫生—口腔医学]