磁控溅射制备Cu_2ZnSnS_4薄膜的研究进展  

Progress in Preparation of Cu_2ZnSnS_4 Thin Film by Magnetron Sputtering

作　　者：沈韬[1,2] 陈怡琦[1,2] 朱艳[1,2] 甘国友[1,2] 易建宏[1,2] 

机构地区：[1]昆明理工大学材料科学与工程学院,昆明650093 [2]云南省新材料制备与加工重点实验室,昆明650093

出　　处：《材料导报》2016年第21期14-20,共7页Materials Reports

基　　金：国家自然科学基金(61302042);昆明理工大学材料科学与工程学院拔尖人才项目(2015-2017);云南省新材料制备与加工重点实验室开放基金(2015)

摘　　要：Cu_2ZnSnS_4(CZTS)薄膜由于其合适的禁带宽度、高的光吸收系数以及组分无毒、储量丰富等特性,被视为薄膜太阳能电池最佳的吸收层材料之一。磁控溅射是制备CZTS薄膜的主要方法之一,因为其制备过程相对简单且可以产业化,一直是太阳能电池领域的研究热点。从磁控溅射制备CZTS薄膜的3种路径出发,综述了近年来各种路径在制备CZTS薄膜方面的研究进展,比较了3种路径的优缺点,同时对磁控溅射制备CZTS薄膜的发展前景进行了展望。The Cu2 ZnSnS4 （CZTS）thin film is considered as one of the most suitable absorbing layer materials for thin film solar cells due to its proper band gap,high optical absorption coefficient and non-toxicity and earth-abun-dant raw materials.Magnetron sputtering is one of the main methods to prepare CZTS thin films.Since its relatively simple process which enables industrial production,the magnetron sputtering has also been a hot research topic in the field of preparating CZTS thin films.In this paper,the recent research progress on the preparation of CZTS thin films by magnetron sputtering in three routes is reviewed and the characteristics of the three paths are compared.Besides, the development prospect of the deposition of CZTS thin films by magnetron sputtering is discussed.

关 键 词：磁控溅射 CU2 ZnSnS4 薄膜 

分 类 号：TK02[动力工程及工程热物理]