磁控溅射制备持久性银反射镜研究  

Durable Silver Reflector Prepared by Magnetron Sputtering

作　　者：徐旭[1,2] 何文彦[1] 王长军[1] 魏铭[1] 李斌成[1,3] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209 [2]中国科学院大学,北京100049 [3]电子科技大学光电信息学院,四川成都610054

出　　处：《中国激光》2016年第12期127-134,共8页Chinese Journal of Lasers

摘　　要：研究了磁控溅射制备Sub／NiCrNx／Ag／NiCrNx／SiNx／Air多层结构银反射镜的特性，分析了Nz对Ag薄膜、介质保护层及银反射镜光谱的影响。采用深度剖析X射线光电子能谱和透射电子显微镜分析了银反射镜短波波段（400-500nm）反射率偏低的原因。采用分光光度计、扫描电子显微镜和X射线衍射仪研究了N2占比对Ar／N2混合气体溅射制备单层银膜光学性质、表面形貌及晶向结构的影响，比较了不同Ar／N2比例混合气体溅射制备银反射镜的反射率，并分析了对应样品SiN。保护层的化学计量比。实验结果显示，溅射制备银膜时，在Ar中引入一定比例的N2，SiNx保护层的化学计量比得到改善。当N2体积比由0上升至40％时，Ar／N2混合气体溅射制备的银反射镜在400nm波长处反射率由71．7％提高到79．3％。此外，基于Ar／N2混合气体溅射溅射制备的银反射镜样品具备优良的环境稳定性。The characteristics of Sub/NiCrNx/Ag/NiCrNx/SiNx/Air multilayer structure of silver reflector prepared by magnetron sputtering are studied and the influences of N2 on the spectrums of Ag thin film, dielectric protective layer and silver mirror are analyzed. The reasons to cause low reflectance of the silver films at short- wavelength region （400--500 nm） are investigated via depth profiling with X-ray photoelectron spectroscopy and transmission electron microscope. The influences of N2 proportion of Ar/N2 on the optical properties, surface topography and crystal structure of prepared single-layer silver films are investigated during sputtering deposition via spectrophotometry, scanning electron microscopy, and X-ray diffraction. Moreover, the reflectances of prepared- silver mirrors prepared by different gas flow ratios of Ar/N2 plasma are compared and the stoichiometric ratio of SiNx thin films is analyzed. Experimental results proves that, the stoichiometric ratio of SiNx thin films is ameliorated when the silver target is sputtered with the plasma of mixed argon and nitrogen. The reflectance of the prepared silver mirrors at 400 nm wavelength is improved from 71.7% to 79.3% as the N2/Ar gas flow ratio changed from 0 to 40%. Furthermore, the silver mirrors prepared by magnetron sputtering in Ar/N2 plasma present excellent corrosion resistance and environmental stability.

关 键 词：薄膜 银反射镜 磁控溅射 SiNx薄膜 Ar/N2混合 

分 类 号：O484.4[理学—固体物理]