扫描干涉场曝光光束自动对准及其收敛性分析  

Beam Alignment and Convergence Analysis of Scanning Beam Interference Lithography Systems

作　　者：王玮[1,2] 巴音贺希格[1] 宋莹[1] 姜珊[1] 潘明忠[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所国家光栅制造与应用工程技术研究中心,吉林长春130033 [2]中国科学院大学大珩学院,北京100049

出　　处：《中国激光》2016年第12期170-177,共8页Chinese Journal of Lasers

基　　金：国家重大科研装备研制项目(61227901)

摘　　要：光束自动对准技术是扫描干涉场曝光系统中的关键技术之一,两曝光光束位置与角度的重合程度直接影响所制作光栅掩模的槽型质量。针对光束对准过程中光束调整的两个运动维度之间存在相互耦合的情况,推导了存在耦合时对准算法的收敛条件,并分析了光路中反射镜与解耦平面之间存在的装调误差对对准性能的影响。分析得出,装调误差降低了光束对准系统性能,甚至导致对准算法发散,通过调节光路中反射镜M_2和解耦平面的距离L_2与反射镜M_1和解耦平面的距离L_1的比值L_2/L_1可以优化系统的收敛性能。实验结果表明,当L_2/L_1较大时对准系统调节性能较差,收敛速率较低;当L_2/L_1较小时光束对准系统可以快速地收敛到目标位置,有效地对光束进行对准调节。推导证明与模拟分析可为光束对准系统以及整个曝光光路的设计提供理论指导。Beam alignment is one of the key techniques in the scanning beam interference lithography system. The coincidence degree between the position and the angle of two exposure beams directly affects the groove quality of the produced grating mask. In view of the mutual coupling between the two dimensions of motion in beam adjustment, the convergence condition of the alignment algorithm is derived, and the influence of assembly error between the reflector and the deeoupling plane on the alignment performance is analyzed. The analysis shows that due to the presence of assembly error, the performance of the beam alignment system declines, and even leads to the divergence of the alignment algorithm. The convergence of the system can be optimized by adjusting the ratio L2/ L~, where L~ is the distance between mirror M~ and decoupling plane, and L2 is the distance between mirror M2 and deeoupling plane. The experimental results show that when L2/L1 is large, performance of the alignment system is poor and the convergence is slow. When L2/L1 is relatively small, the beam alignment system can quickly converge to the target position, and the alignment of the beam is effective. The deduction and simulation analysis can provide theoretical guidance for the design of beam alignment systems and whole exposure light paths.

关 键 词：光栅 扫描干涉场曝光系统 光束对准 收敛性能 装调误差 

分 类 号：O436.1[机械工程—光学工程]