磁控溅射用难熔金属靶材制作、应用与发展  

Manufacture,application and development of refractorymetal target used on magnetron sputtering

作　　者：贾国斌[1] 冯寅楠[1] 贾英 

机构地区：[1]北京有色金属研究总院,北京100088 [2]邢台轧辊机电工程有限公司,河北邢台054001

出　　处：《金属功能材料》2016年第6期48-52,共5页Metallic Functional Materials

摘　　要：随着磁控溅射技术应用日益广泛,难熔金属靶材需求不断增大。就难熔金属靶材应用、制备及发展进行总结和探讨,分析了制作过程中致密度、纯度、晶粒尺寸及结晶取向对靶材性能的影响,并对难熔金属靶材的发展趋势进行展望。With the application of magnetron sputtering increasing, requirement of refractory metal target kept ex- panding. Application, preparation and development of refractory metal target was summarized and discussed. Influ- ence of the density, the purity, the grain size and the crystal orientation to the target was analyzed. Development trend of the target was also forecasted.

关 键 词：磁控溅射 高纯难熔金属 靶材 

分 类 号：TB383.2[一般工业技术—材料科学与工程] TG14[金属学及工艺—金属材料]