靶材刻蚀对磁控溅射制备ZnO:Al薄膜性能空间分布的影响  

Impact of Target Erosion on Non-Uniform Distributions of Properties of Magnetron Sputtered ZnO:Al Coatings

作　　者：彭寿[1,2] 张宽翔[1,2] 蒋继文[1,2] 杨勇[1,2] 姚婷婷[1,2] 曹欣[1,2] 李刚[1,2] 金克武 徐根保[1,2] 王芸[1,2] 

机构地区：[1]浮法玻璃新技术国家重点实验室,蚌埠233000 [2]蚌埠玻璃工业设计研究院,蚌埠233018

出　　处：《真空科学与技术学报》2016年第12期1373-1380,共8页Chinese Journal of Vacuum Science and Technology

基　　金：安徽省科技攻关计划项目(1501021046)

摘　　要：采用未经使用和经长时间使用后的新旧掺铝氧化锌(AZO)圆形平面陶瓷靶,直流磁控溅射制备AZO薄膜,基片分别正对靶材水平放置和立在屏蔽罩旁竖直放置,并通过X射线衍射仪、霍尔效应测试系统、光学椭偏仪等设备分析其结构和光电性能,系统地研究靶材刻蚀对磁控溅射制备AZO薄膜性能空间分布的影响。研究表明,氧负离子是造成靶材刻蚀导致薄膜性能空间差异的主要原因,对于水平放置径向分布的AZO薄膜,采用新靶制备时,靶材刻蚀位置处,氧负离子对薄膜损伤作用最大,(002)晶面间距增大,电学性能最差,而在正对靶中心及其他位置处电学性能较佳,随着靶材刻蚀的加深,氧负离子对正对靶中心位置处的薄膜损伤作用最大,结晶性能和电学性能最差;而对于竖直放置纵向分布的AZO薄膜,由于受氧负离子作用弱,采用新旧靶制备的薄膜性能分布规律相似,薄膜电学和结晶性能较水平放置均有所提升,某些位置处电阻率可达(7~8)×10^(-4)Ω·cm,但可见光透过率有所下降。The influence of target erosion, on non- uniform distributions of the microstructures and optical properties of the ZnO ： Al （AZO） coatings deposited by DC magnetron sputtering, was investigated with X-ray dif- fraction, hall effect measurement and ellipsometry. The substrates were aligned parallel （normal） to the brand-new and/or heavily-used AZO disk-shaped ceramic targets, respectively. The results show that the oxygen ions, generated at the heavily sputtered areas, accelerated by the target voltage and emitting from the target surface to the substrate, significantly damaged the AZO coatings, resulting in serious non-uniform distributions of the film thickness, micro- structures and optical properties. For example, aligned parallel to a new target, the film＇ s properties, at its center and facing the eroded spots,increasingly deteriorated with increased sputtering time because of strong O - ions bom- bardment,whereas the AZO coatings ,aligned normal to an old target, have a resistivity of （7-8）×10^-4Ω·cmbecause of weak impact of O - ions.

关 键 词：靶材刻蚀 AZO薄膜 氧负离子 空间分布 

分 类 号：O484[理学—固体物理]