磁控溅射时间对4Cr13钢表面沉积钨组织及性能的影响  

Effect of Magnetron Sputtering Time on Structure and Properties of Deposition W on Surface of 4Cr13 Steel

作　　者：彭凯[1] 高原[1] 宋沂泽 王成磊[1] PENG Kai GAO Yuan SONG Yize WANG Chenglei(School of Materials Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, China)

机构地区：[1]桂林电子科技大学材料科学与工程学院,广西桂林541004

出　　处：《热加工工艺》2017年第2期155-157,共3页Hot Working Technology

基　　金：国家自然科学基金资助项目(51264007);国家自然科学基金青年基金资助项目(51201043);广西信息材料重点实验室重点项目(1210908-214-Z);广西自然科学基金资助项目(2015GXNSFBA139214);桂林电子科技大学研究生教育创新计划资助项目(YJCXB201501);广西科学研究与技术开发科技攻关计划项目(桂科攻12118020-2-2-1);桂林电子科技大学-桂林电科院研究生联合培养基地专项经费资助项目(20141103-09-Z)

摘　　要：利用磁控溅射在4Cr13钢表面先沉积一层铜,再在铜上沉积一层金属钨。研究了磁控溅射时间对4Cr13钢表面沉积钨组织及性能的影响,结果表明:沉积层厚度随溅射时间的增长呈非线性增加,20、30、40、50 min对应的沉积层厚度分别为1、2、2.5、3μm;沉积层与基体材料间具有良好的结合力,其中溅射时间为50 min,试样结合力最高,达到32 N。Metal W film was deposited on the surface of iron-based lead frames which has been deposited metal Cu film firstly by magnetron sputtering technique. The influences of magnetron sputtering time on the structure and properties of 4Cr13 steel surface depositing W were studied. The results show that with the increase of sputtering time, the thickness of the deposited layer increases in non-linear. When the sputtering is 20 min, 30 min, 40 min and 50 min, the thickness of the corresponding deposited layer is 1μm, 2 μm, 2.5 μm and 3 μm, respectively. The deposited layer and the substrate material have a good bonding force. When the sputtering time is 50 min, the bonding force of the sample is the highest, reaching 32N.

关 键 词：磁控溅射 钨 结合力 薄膜 

分 类 号：TG115[金属学及工艺—物理冶金] TG174.444[金属学及工艺—金属学]