Effect of Radio Frequency Magnetron Sputtering Power on Structural and Optical Properties of Ti6A14V Thin Films  

Effect of Radio Frequency Magnetron Sputtering Power on Structural and Optical Properties of Ti6A14V Thin Films

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作  者:Mohammed K. KHALAF H. F. Al-TAAY Dawood S. ALI 

机构地区:[1]Ministry of Science and Technology, Center of Applied Physics, Baghdad, Iraq [2]Department of Physics, College of Science for Women, University of Baghdad, Baghdad, Iraq [3]Department of Physics, College of Education for Pure Sciences, University of Anbar, Anbar, Iraq

出  处:《Photonic Sensors》2017年第2期163-170,共8页光子传感器(英文版)

摘  要:In this research, the effects of target sputtering power on the structure and optical properties of radio frequency (RF) sputtered Ti6A14V films were investigated. Different sputtering RF powers were used to produce different thicknesses of Ti6A14V thin films, From the X-ray diffraction, it was found that the Ti6A14V films had polycrystalline cubic and hexagonal structures and increased films crystallinity and crystalline size with increasing the sputtering power. Atomic forces microscopy (AFM) gave us a nanometric film character, films homogeneity, and surfaces roughness. A higher degree of roughness and average grain size with increasing RF power was exhibited. Band gap and refractive index of Ti6A14V thin films varied with sputtering RF powers.In this research, the effects of target sputtering power on the structure and optical properties of radio frequency (RF) sputtered Ti6A14V films were investigated. Different sputtering RF powers were used to produce different thicknesses of Ti6A14V thin films, From the X-ray diffraction, it was found that the Ti6A14V films had polycrystalline cubic and hexagonal structures and increased films crystallinity and crystalline size with increasing the sputtering power. Atomic forces microscopy (AFM) gave us a nanometric film character, films homogeneity, and surfaces roughness. A higher degree of roughness and average grain size with increasing RF power was exhibited. Band gap and refractive index of Ti6A14V thin films varied with sputtering RF powers.

关 键 词:RF magnetron sputtering TI6A14V structural properties optical properties. 

分 类 号:TP[自动化与计算机技术]

 

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