激光沉积大面积均匀类金刚石膜的设计改进及实验  

Improved Design and Experiment for Preparing Uniform Optical DLC Film by Large Area PLD

作　　者：陆益敏[1] 黄国俊[1] 郭延龙[1] 丁方正[1] 陈霞[1] 韦尚方[1] 米朝伟[1] 

机构地区：[1]武汉军械士官学校光电技术研究所,湖北武汉430075

出　　处：《兵工学报》2017年第3期555-560,共6页Acta Armamentarii

基　　金：国家部委预先研究项目(51318060212)

摘　　要：针对激光等离子体的边缘粒子对激光沉积类金刚石膜性能的不利影响,改进自转衬底一维变速平移技术的大面积均匀镀膜机构。利用开孔的挡板滤除等离子体边缘的粒子,同时在原有膜厚分布数学模型中加入相应的模块;通过优化模型中的机构运动参数,指导实验获得了直径200 mm的大面积均匀类金刚石膜。测试结果表明:该类金刚石膜的不均匀性为±4.5%,且膜厚分布特征与理论优化结果相同,同时纳米硬度和红外透过率较改进前显著提高;相对于改进前的大面积均匀镀膜技术,改进后的机构具有更实际的应用价值。The former coating setup for uniform film is improved by considering the effect of the peripheral particles of plasma on the diamond-like carbon（ DLC） film prepared by pulsed laser deposition（ PLD）. A shield with an aperture is inserted between the substrate and the target to remove the peripheral particles and only allow the centric particles pass the aperture. A corresponding module is added in the mathematical model for thickness distribution of film. The uniform diamond-like carbon film with 200 mm in diameter is prepared after simulation and optimization of model. The test results show that thickness variation of film is ± 4. 5%,and the thickness distribution characteristics are the same as the optimized results. Moreover,the nanohardness and infrared transmittance of film are apparently increased compared with those of the film prepared before improvement.

关 键 词：机械制造工艺与设备 光学薄膜 脉冲激光沉积 类金刚石膜 大面积均匀薄膜 

分 类 号：TN304.2[电子电信—物理电子学]