利用干涉光刻技术制备LED表面微纳结构  

Micro-nano Structures of LED Fabricated by Laser Interference Lithography

作　　者：程俊超[1,2] 刘宏伟[1,2] 耿照新[3] 郭凯[1] 于丹丹[1] 宁平凡[1] 李晓云[1] 张建新[1] 

机构地区：[1]天津工业大学电子与信息工程学院,天津300387 [2]天津市光电检测技术与系统重点实验室,天津300387 [3]中国科学院半导体研究所,北京100083

出　　处：《发光学报》2017年第4期470-476,共7页Chinese Journal of Luminescence

基　　金：天津市自然科学基金(14JCQNJC01000);国家自然科学基金(11404239;61575144;61504093);集成光电子学国家重点联合实验室开放课题(IOSKL2014KF15)资助项目~~

摘　　要：为了制备大面积周期性微纳米结构以提高LED的发光效率,建立了劳厄德(Lloyd)干涉光刻系统。简单分析了该干涉光刻系统的工作原理,并介绍了利用干涉曝光工艺制备一维光栅、二维点阵、孔阵列等纳米结构图形的具体实验过程。最后对纳米图形进行结构转移,制备出了金属纳米结构。实验结果表明:利用劳厄德干涉光刻系统,可以在20 mm×20 mm大小的ITO衬底上稳定制备出周期为450 nm的均匀光栅或二维点阵列图形结构,它们的占空比也是可以调节变化的。In order to realize the preparation of large-area periodic micro-nano structures to enhance the luminous efficiency of LEDs,Lloyd laser interference lithography（ LIL） system was established.The working principle of LIL system was simply analyzed and the experimental process of preparing the one-dimensional gratings,two-dimensional lattice and hole arrays was introduced.Finally,the nano-structures were transferred into suitable functional substrates for further applications.The experimental results indicate that the uniform gratings or two-dimensional lattice arrays structures with the period of 450 nm,whose duty cycle can also be changed,are successfully fabricated on 20 mm ×20 mm ITO substrates by using the LIL system.

关 键 词：干涉光刻 周期结构 发光二极管 光提取 

分 类 号：TN383.1[电子电信—物理电子学]