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作 者:钟博扬 王维[2] 李芳芳[3] 叶小球[1] 陈长安[1] 罗文华[1]
机构地区:[1]表面物理与化学重点实验室,江油621908 [2]四川大学原子与分子物理研究所,成都610065 [3]中国工程物理研究院,绵阳621907
出 处:《真空科学与技术学报》2017年第4期345-350,共6页Chinese Journal of Vacuum Science and Technology
摘 要:针对目前大多数标准漏孔的漏率都是在He和入口压力为100 kPa下的漏率,采用定容变压法校准了铭牌漏率为2.3×10^(-6)Pa·m^3/s的标准真空漏孔在使用H_2、He、D_2三种气体时,在不同入口压力下的漏率。预先对系统进行了加热除气后计算了系统本底漏率大小,并探讨了本底漏率对校准漏孔漏率的影响。结合粘滞流-分子流理论研究了不同气体和漏孔入口压力对漏孔漏率的影响。The influence of the new leak-rate calibration conditions of the reference leaks, including the background leak (outgassing) -rate, inlet-pressure (p) and gases' viscosity ( He, H2 and D2 ), on theleak-ratewas theoretically analyzed in viscous molecular flow theory and experimentally investigated in constant volume method with a reference leak at a leak-rate of 2.3×10^-6Pa·m^3/s. The results show that the leak-rate depends significantly on the gas type and inlet-pressure, but weakly on the background "leak-rate". To be specific, for a reference leak at 2. 3×10^-6Pa·m^3/s in 100 -400 kPa range,the leak-rate of H2, He and D2 (in viscosity molecular flow) is linearly proportional to p2 ; but at a fixed inlet-pressure, the leak-rate is inversely proportional to the gas' s viscosity ; He (H2 ) has the largest (smallest) leak-rate among the gases because of the highest (lowest) viscosity; and calibrted at a leak-rate below 10^-7Pa·m^3/s,the usually negligible background leak-rate of 1.15×10^-8Pa·m^3/s makes the difference.
分 类 号:TB77[一般工业技术—真空技术]
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