基于压电雾化喷涂的光刻胶涂覆工艺及其应用研究  

Study on photoresist coating process and applications based on piezoelectric spray coating

作　　者：翟荣安 汝长海[1,2,3] 陈瑞华[1,2,3] 朱军辉[1,2,3] 

机构地区：[1]苏州微赛智能科技有限公司,江苏苏州215200 [2]苏州大学机器人与微系统研究中心,江苏苏州215021 [3]上海大学机电工程与自动化学院,上海200072

出　　处：《黑龙江科学》2017年第6期98-100,共3页Heilongjiang Science

基　　金：江苏省科技项目科技型企业技术创新资金项目(BC2015130);苏州市科技计划项目姑苏创新创业领军人才专项(ZXL2016035);吴江区科技领军人才计划项目

摘　　要：本文在自主搭建的压电雾化喷涂系统上,以RFJ-210负性光刻胶为研究对象,抛光硅片为基材,分别研究了稀释体积比、速度以及距离等喷涂工艺对光刻胶薄膜平均厚度及均匀性的影响。并以表面具有非平面凸台结构的ITO玻璃为基材,分别进行压电雾化喷涂法和旋转法涂胶,实验结果表明:压电雾化喷涂法可以在三维形貌结构表面上涂覆,克服了传统旋转法无法在三维形貌结构表面上涂胶的缺陷,验证了压电雾化喷涂法在三维形貌结构表面应用中的可行性。The effects of dilution volume ratio, velocity and distance on average thickness and uniformity of the film of RFJ-210 negative photoresist obtained on polished silicon wafer as substrate were analyzed by using a home-buih piezoelectric spraying system. The ITO glass with convex structure was coated with RFJ-210 by centrifugal spinning and piezoelectric spraying methods respectively. The results showed that clear and complete patterns can be formed on three- dimensional structures by piezoelectric spray coating, overcoming the problem that three-dimensional structures cannot be coated by centrifugal spinning method and proving feasibility of piezoelectric spraying for three-dimensional structures.

关 键 词：负性光刻胶 压电雾化喷涂 平均厚度 均匀性 抛光硅片 凸台结构 

分 类 号：TN305[电子电信—物理电子学] TH122[机械工程—机械设计及理论]