基于聚合物亚微米锥形孔阵列的SERS基底制备  

SERS substrate fabrication based on submicron structure of polymeric conical pore array

作　　者：赵文宁[1] 吴一遥 刘晓光[1] 徐智谋[1] 

机构地区：[1]华中科技大学光学与电子信息学院,湖北武汉430074

出　　处：《华中科技大学学报（自然科学版）》2017年第5期122-126,共5页Journal of Huazhong University of Science and Technology(Natural Science Edition)

基　　金：国家自然科学基金资助项目(61474048);国家高技术研究发展计划资助项目(2015AA043302)

摘　　要：提出一种基于聚合物亚微米锥形孔阵列结构的SERS基底的制备方法.利用纳米压印和干法刻蚀技术,制备了亚微米级锥形硅模板,然后在其上沉积金纳米颗粒,最后通过热纳米压印技术将硅模板的结构及金纳米颗粒阵列转移到聚合物IPS上,得到一种镶嵌有金纳米颗粒的IPS亚微米锥形孔阵列结构.研究结果表明:所到得的SERS基底对R6G分子的拉曼增强因子可达到9.2×107,对浓度为1×10-12 mol/L的R6G溶液仍能测到明显的拉曼信号;此基底具有较好的重复性,测得R6G的六个主要拉曼峰强度的相对标准偏差值均小于13%,而且具有优异的柔性与透明性;与常规SERS基底相比较,具有质量轻、可折叠、便携和易处理等优势.By using nanoimprint lithography （NIL） and inductively coupled plasma （ICP） technology, surface enhanced Raman scattering （SERS） substrate based on submicron structure of polymeric coni- cal pore array was fabricated in submicron level. Au nanoparticles were deposited on the surface of Si based template, then the submicron array structure was duplicated onto the polymer wafer and the Au nanoparticles were inlaid into the polymer-based array via thermal NIL method. Research results show that the obtained substrate can make the detection limit of R6G lower than 1 ×10^-12 mol/L and EF （enhancement factor） calculated to be about 9.2 ×10^7. The substrate demonstrates brilliant reproduc- ibility and the RSD values corresponding to the six major SERS peaks of R6G are all below 13G. Mo- reover, the SERS （relative standard deviation） substrate possesses excellent transparency and flexibil- ity. The SERS intensity acquired from this substrate almost remains constant after 200 bending cy- cles. Compared with the traditional SERS substrates, the obtained substrate is highly lightweight, foldable, portable and easily handled.

关 键 词：表面增强拉曼散射 纳米压印 亚微米结构 金纳米颗粒 基底 

分 类 号：TB383[一般工业技术—材料科学与工程]