大口径半球形基底膜层均匀性的分析  

Analysis on Membrane Layer Uniformity of Large Diameter Hemispherical Basemen

作　　者：高健[1] 付新华[1] GAO Jian FU Xinhua(School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun 130022)

机构地区：[1]长春理工大学光电工程学院,长春130022

出　　处：《长春理工大学学报（自然科学版）》2017年第2期53-56,共4页Journal of Changchun University of Science and Technology(Natural Science Edition)

摘　　要：针对半球面大口径球形光学元件的膜层均匀性进行了理论分析研究。通过建立半球形基底内表面的数学模型,运用膜厚理论公式表达出内表面的膜厚分布。推算了蒸发源不同位置对膜层均匀性的影响,同时对理想点源、小面源和实际蒸发特性对膜厚的影响进行了分析。该研究工作对大曲率半球膜层镀制工艺具有一定的指导意义,在改善此种表面膜层均匀性上提供了理论依据。Hemispherical surface of large caliber spherical optical element, the author of this paper film uniformity are analyzed in theory research. Through the mathematical model was established,the inner surface of the spherical basal theory of film thickness formula expresses the inner surface of the film thickness distribution. Calculate the evaporation source position influence on film uniformity,and the ideal point source,non-point source and actual evaporation characteristics influence on film thickness are analyzed. The research work on the large curvature hemisphere film plating process has a certain guiding significance,to improve the uniformity of surface film layer provides theory basis.

关 键 词：大口径光学元件 真空镀膜 膜厚均匀性 内表面 

分 类 号：O484[理学—固体物理]