电弧离子镀沉积碳膜的结构和疏水性能  

Structure and hydrophobic properties of carbon films by arc ion plating

作　　者：曲泓函 刘婵[1] 张川[1] 黄美东[1] 

机构地区：[1]天津师范大学物理与材料科学学院,天津300387

出　　处：《天津师范大学学报（自然科学版）》2017年第3期11-14,30,共5页Journal of Tianjin Normal University：Natural Science Edition

摘　　要：为了研究脉冲偏压对薄膜结构和疏水性能的影响,采用电弧离子镀技术在不锈钢和硅基底材料上沉积了纯碳薄膜,在保持直流偏压、频率和占空比等工艺参数稳定的情况下,在不同脉冲偏压下制备获得纯碳薄膜.分别利用X线衍射仪、X线光电子能谱、扫描电镜、摩擦磨损仪和接触角测量仪对薄膜样品的微观结构、表面形貌、摩擦系数和疏水性能进行测试.结果表明:沉积所得纯碳薄膜均呈非晶态,随着脉冲偏压的升高,纯碳薄膜表面形貌质量先变好再变坏;摩擦系数先变小后变大,但变化幅度不大;接触角先减小后增大.脉冲偏压为300 V时,样品表面形貌最平整,摩擦系数最小,为0.192;在脉冲偏压为500V时,纯碳薄膜样品的接触角平均值最大,为102.53°,疏水性能最好.In order to study the effect of pulsed bias on membrane structure and hydrophobicity, pure carbon thin films were deposited on substrates such as stainless steel and silicide using arc ion plating with different pulsed biases while other parameters including dc bias, frequency and duty ratio were kept as constants. Microstructure, surface morphology, friction coefficient and hydrophobic property of the films were measured by X-ray diffraction, X-ray photoelectric spectroscopy, scanning electron microscopy, friction and wear tester, and contacting-angle tester, respectively. The experimental results show that the all carbon films are non-crystalline. While the pulsed bias is enlarged, the surface quality of the carbon films is improved firstly and then becomes worse, and friction coefficient drops at first and then increases, but the variation is small. The contact angle of the films decreases and then increases while the pulsed bias increases. As the pulsed bias reaches 300 V, the sample, having the smallest friction coefficient, 0.192, achieves the smoothest surface morphology. The largest contact angle, 102.53°, showing the best hydrophobic property, achieves at a pulsed bias of 500 V.

关 键 词：电弧离子镀 纯碳薄膜 脉冲偏压 疏水性能 接触角 摩擦性能 

分 类 号：O484.2[理学—固体物理]