卷对卷紫外压印超疏水薄膜的工艺及装置  

Development of a Roll-to-Roll Ultraviolet Imprint Lithography Equipment for Superhydrophobic Film Fabrication

作　　者：邹业兵[1,2] 王智伟[1] 吴天准[1] 彭智婷 ZOU Yebing WANG Zhiwei WU Tianzhun PENG Zhiting(Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China Zhejiang University, Hangzhou 310027, China Central South University of Forestry and Technology, Changsha 410004, China)

机构地区：[1]中国科学院深圳先进技术研究院,深圳518055 [2]浙江大学,杭州310027 [3]中南林业科技大学,长沙410004

出　　处：《集成技术》2017年第3期59-67,共9页Journal of Integration Technology

基　　金：深圳市知识创新计划技术研究(JCYJ20140417113430581)

摘　　要：为了实现大面积、批量化制备超疏水表面材料,文章开发了一种新型的卷对卷紫外压印技术并研制了相应装置。通过卷对卷微纳压印及快速光固化紫外固化胶将母版上的精细微米图形转移到目标柔性衬底上,无需复杂的制备工艺或苛刻的洁净加工环境,实现超疏水薄膜的快速、高效、批量化制备。文章着重讨论了应用于制备超疏水薄膜的卷对卷紫外压印工艺过程及对应各工艺而设计的机械功能模块。经工艺改进,选用改性的紫外固化胶,转印复制了20μm×40μm×17μm(直径×间距×柱高)的微结构阵列,所得超疏水薄膜经氟化处理后与水接触角可达150°以上。最后,尝试使用该装置制备T型微纳结构阵列以获得疏水性更佳的表面材料。In this paper, a new roll-to-roll ultraviolet imprint lithography （RtR UV IL） technology was proposed and an equipment for large area super-hydrophobic materials fabrication was developed. By using the RtR micro/nano imprint method and fast UV curing technology, the micro patterns could be transferred to a flexible substrate without complex fabrication process in a clean room. Through this way, large area superhydrophobic film could be fabricated rapidly and efficiently. This paper focuses on discussing the RtR UV IL technology and the related mechanical parts of the equipment which is used for the superhydrophobic film fabrication. After optimizating, a 20 μm×40 μm×17 μm （diameter×pitch×height） micro-structure array was successfully transferred by using modified UV resist. The water contact angle reached up to 150° after fluoride treatment. Finally, we attempted to fabricate T-shaped micro-pillar array by using this equipment to obtain super-hydrophobic materials.

关 键 词：卷对卷 超疏水 紫外固化 微纳加工 

分 类 号：TB383.2[一般工业技术—材料科学与工程]